Self-Aligned WOx S/D Contacts to Gate Stacks with TiOx Nucleation Layer by Multiple-Deposition Method in WSe2 pFETs

Publication Information

Title

Japanese:
English:	Self-Aligned WOx S/D Contacts to Gate Stacks with TiOx Nucleation Layer by Multiple-Deposition Method in WSe2 pFETs

Author

Japanese:	梶川亮介, 川那子高暢, 宗田伊理也, 星井拓也, 角嶋邦之, 筒井一生, 若林整.
English:	Ryosuke Kajikawa, Takamasa Kawanago, Iriya Muneta, Takuya Hoshii, Kuniyuki Kakushima, Kazuo Tsutsui, Hitoshi Wakabayashi.

Language

English

Journal/Book name

Japanese:
English:

Volume, Number, Page

Published date

Sept. 6, 2023

Publisher

Japanese:
English:

Conference name

Japanese:
English:	International Conference on Solid State Devices and Materials

Conference site

Japanese:	名古屋
English:	Nagoya