Accelerating EUV lithography simulation with weakly guiding approximation and STCC formula

Publication Information

Title

Japanese:
English:	Accelerating EUV lithography simulation with weakly guiding approximation and STCC formula

Author

Japanese:	田邊容由, 神宮司明良, 高橋篤司.
English:	Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi.

Language

English

Journal/Book name

Japanese:
English:	Proc. SPIE 12750, International Conference on Extreme Ultraviolet Lithography 2023, 127500D

Volume, Number, Page

Published date

Nov. 21, 2023

Publisher

Japanese:
English:	Society of Photo-Optical Instrumentation Engineers (SPIE)

Conference name

Japanese:
English:

Conference site

Japanese:
English:	Monterey California

File

DOI