Accelerating extreme ultraviolet lithography simulation with weakly guiding approximation and source position dependent transmission cross coefficient formula

Publication Information

Title

Japanese:
English:	Accelerating extreme ultraviolet lithography simulation with weakly guiding approximation and source position dependent transmission cross coefficient formula

Author

Japanese:	田邊容由, 神宮司明良, 高橋篤司.
English:	Hiroyoshi Tanabe, Akira Jinguji, Atsushi Takahashi.

Language

English

Journal/Book name

Japanese:
English:	Journal of Micro/Nanopattern. Mater. Metrol (JM3)

Volume, Number, Page

Vol. 23 Issue 1

Published date

Jan. 2, 2024

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

DOI