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Title
Japanese: 
English:Comparison of Electron Densities and Temperatures in Helium and Argon Nonthermal Atmospheric-Pressure Plasmas by Continuum Spectral Analysis 
Author
Japanese: 山家清之, 和泉田智也, 大山巌丈, 赤塚洋.  
English: Kiyoyuki Yambe, Tomoya Izumida, Iwao Ohyama, Hiroshi Akatsuka.  
Language English 
Journal/Book name
Japanese: 
English:IEEE Transactions on Plasma Science 
Volume, Number, Page Vol. 52    No. 2    pp. 384-394
Published date Jan. 31, 2024 
Publisher
Japanese: 
English:IEEE 
Conference name
Japanese: 
English: 
Conference site
Japanese: 
English: 
Official URL https://ieeexplore.ieee.org/document/10417864
 
DOI https://doi.org/10.1109/TPS.2024.3355486
Abstract In this study, the electron densities and temperatures in helium and argon nonthermal atmospheric-pressure plasmas are obtained by continuum spectral analysis, and a comparison is made to investigate the factors that cause differences in these two quantities. The helium and argon plasmas are irradiated onto a floating copper disk. In both plasmas, the plasma plume is formed with the same length between the edge of the powered electrode and the surface of the copper disk, and the flow rate of each neutral gas is controlled to obtain the same electron thermal pressure, which is the product of the electron density and temperature. The same charge is generated in both plasmas, and so the same potential and thermal energy are obtained in both plasmas by controlling the flow rate of each neutral gas. When the electron temperature of both plasmas is 1–2 eV, the electron collision cross section of helium gas is larger than that of argon gas. Because the collision frequency between electrons and neutral particles is high under atmospheric pressure, the electron density is affected by the electron collision cross section corresponding to the electron thermal energy. Consequently, the electron temperature of the helium plasma is lower than that of the argon plasma, while the electron density of the helium plasma is higher than that of the argon plasma for the same electron thermal pressure.

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