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Title
Japanese: 
English:Precise waveguide loss extraction using 300-mm wafer-level OFDR for optical process control monitoring 
Author
Japanese: 堀川 剛, 北村 敦, 八谷 将典, 西山 伸彦.  
English: Tsuyoshi Horikawa, Atsushi Kitamura, Masanori Yatani, Nobuhiko Nishiyama.  
Language English 
Journal/Book name
Japanese: 
English:Proceedings of IEEE SiPhotonics 2024 
Volume, Number, Page        
Published date Apr. 15, 2024 
Publisher
Japanese: 
English:IEEE 
Conference name
Japanese:IEEE SiPhotonics 2024 
English: 
Conference site
Japanese:浦安 
English:Urayasu 
Abstract The propagation loss for silicon waveguides extracted by wafer-level OFDR was verified by comparing it with the cutback method. As the results of evaluating for 256 waveguides with a width of 420-480 nm, the OFDR and cut-back methods found to provide almost the same loss with a correlation coefficient of 0.96, indicating the applicability of OFDR to manufacturing monitoring.

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