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Title
Japanese: 
English:Quantitative analysis of optical emission spectroscopy for plasma process monitoring 
Author
Japanese: 赤塚 洋.  
English: Hiroshi Akatsuka.  
Language English 
Journal/Book name
Japanese: 
English:Japanese Journal of Applied Physics 
Volume, Number, Page Vol. 63    No. 5    p. 050102
Published date May 21, 2024 
Publisher
Japanese: 
English:IOP Publishing 
Conference name
Japanese: 
English: 
Conference site
Japanese: 
English: 
Official URL https://iopscience.iop.org/article/10.35848/1347-4065/ad3da0
 
DOI https://doi.org/10.35848/1347-4065/ad3da0
Abstract Plasma parameters should be evaluated to control the plasma process adequately with non-invasive method, one of which is the optical emission spectroscopy (OES) measurement. Some OES studies are reviewed to measure electron density Ne, electron temperature Te and electron energy distribution function (EEDF) of argon plasma with low-electron temperature (Te ∼ 1–10 eV) under not only low-pressure condition but also atmospheric-pressure discharge. The basics and applications of a method are described using the "collisional radiative model." The methods to deduce the plasma parameters are explained in terms of detailed description of kinetic balance of excited states with elementary processes in the non-equilibrium plasma. In addition, research results on the measurement method of electron temperature, density, and EEDF are introduced for the measurement of atmospheric-pressure non-equilibrium plasma using OES measurement of continuum emission.

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