Reactive sputtering of ferroelectric AlScN films with H2 gas flow for endurance improvement

Publication Information

Title

Japanese:	Reactive sputtering of ferroelectric AlScN films with H2 gas flow for endurance improvement
English:	Reactive sputtering of ferroelectric AlScN films with H2 gas flow for endurance improvement

Author

Japanese:	Si-Meng Chen, 星井拓也, Hitoshi Wakabayashi, Kazuo Tsutsui, Edward Yi Chang, Kuniyuki Kakushima.
English:	Si-Meng Chen, Takuya Hoshii, Hitoshi Wakabayashi, Kazuo Tsutsui, Edward Yi Chang, Kuniyuki Kakushima.

Language

English

Journal/Book name

Japanese:	Japanese Journal of Applied Physics
English:	Japanese Journal of Applied Physics

Volume, Number, Page

Published date

Mar. 1, 2024

Publisher

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English:

Conference name

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English:

Conference site

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English:

Official URL

DOI