OPC において要求光強度が近傍で不均一な状況におけるマスクパターン修正方法

Publication Information

Title

Japanese:	OPC において要求光強度が近傍で不均一な状況におけるマスクパターン修正方法
English:	Mask Pattern Modification Method for OPC to Reduce the Non-uniform Light Intensity

Author

Japanese:	野崎翔太郎, 高橋篤司.
English:	Shotaro Nozaki, Atsushi Takahashi.

Language

Japanese

Journal/Book name

Japanese:	DAシンポジウム2024 論文集
English:	Proc. DA Symposium 2024, IPSJ Symposium Series

Volume, Number, Page

pp. 57-64

Published date

Aug. 2024

Publisher

Japanese:
English:

Conference name

Japanese:
English:

Conference site

Japanese:
English:

Official URL