Absorber dependence of M3D overlay errors in high-NA and hyper-NA EUV lithography

Publication Information

Title

Japanese:	Absorber dependence of M3D overlay errors in high-NA and hyper-NA EUV lithography
English:	Absorber dependence of M3D overlay errors in high-NA and hyper-NA EUV lithography

Author

Japanese:	Hiroyoshi Tanabe, Atsushi Takahashi.
English:	Hiroyoshi Tanabe, Atsushi Takahashi.

Language

English

Journal/Book name

Japanese:
English:	Proc. SPIE

Volume, Number, Page

Vol. 13424 pp. 134240Q-1-6

Published date

Apr. 22, 2025

Publisher

Japanese:
English:	SPIE

Conference name

Japanese:
English:	Advanced lithography + patterning

Conference site

Japanese:
English:	San Jose, CA

File

DOI