Rigorous electromagnetic simulator for extreme ultraviolet lithography and convolutional neural network reproducing electromagnetic simulations

Publication Information

Title

Japanese:
English:	Rigorous electromagnetic simulator for extreme ultraviolet lithography and convolutional neural network reproducing electromagnetic simulations

Author

Japanese:	田邊容由, 下田将之, 高橋篤司.
English:	Hiroyoshi Tanabe, Masayuki Shimoda, Atsushi Takahashi.

Language

English

Journal/Book name

Japanese:
English:	Journal of Micro/Nanopatterning, Materials and Metrology (JM3)

Volume, Number, Page

Vol. 24 issue 2

Published date

May 11, 2025

Publisher

Japanese:
English:	SPIE

Conference name

Japanese:
English:

Conference site

Japanese:
English:

File

DOI