Mask 3D Parameter Prediction in EUV Lithography by Convolutional Neural Network

Publication Information

Title

Japanese:
English:	Mask 3D Parameter Prediction in EUV Lithography by Convolutional Neural Network

Author

Japanese:	高橋篤司, 杉山萌, 下田将之, 田邊容由.
English:	Atsushi Takahashi, Moe Sugiyama, Masayuki Shimoda, Hiroyoshi Tanabe.

Language

English

Journal/Book name

Japanese:
English:	IEEE Asia Pacific Conference on Circuits and Systems (APCCAS)

Volume, Number, Page

Published date

Oct. 2025

Publisher

Japanese:
English:	IEEE

Conference name

Japanese:
English:

Conference site

Japanese:
English:	Busan

File

DOI