STCC formula including polarization and M3D effects in high-NA EUV lithography

Publication Information

Title

Japanese:
English:	STCC formula including polarization and M3D effects in high-NA EUV lithography

Author

Japanese:	田邊容由, 杉山萌, 下田将之, 高橋篤司.
English:	Hiroyoshi Tanabe, Moe Sugiyama, Masayuki Shimoda, Atsushi Takahashi.

Language

English

Journal/Book name

Japanese:
English:	Proc. SPIE

Volume, Number, Page

Vol. 13979

Published date

Feb. 2026

Publisher

Japanese:
English:	SPIE

Conference name

Japanese:
English:	Optical and EUV Nanolithography XXXIX

Conference site

Japanese:
English:

File

DOI