MEMS デバイス作製に向けた微小電極によるパターン密度と電解めっき膜厚分布の関係評価

Publication Information

Title

Japanese:	MEMS デバイス作製に向けた微小電極によるパターン密度と電解めっき膜厚分布の関係評価
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Author

Japanese:	坂梨航太, 栗岡智行, 彦坂元, 町田克之, 飯田慎一, Chun-Yi Chen, Tso-Fu Mark Chang, 伊藤浩之, 三宅美博, 曽根正人.
English:	坂梨航太, Tomoyuki Kurioka, Gen Hikosaka, Katsuyuki Machida, Shinichi Iida, Chun Yi Chen, Tso-Fu Mark Chang, Hiroyuki Ito, Yoshihiro Miyake, Masato Sone.

Language

Japanese

Journal/Book name

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Volume, Number, Page

Published date

July 2026

Publisher

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Conference name

Japanese:	第17回集積化MEMSシンポジウム
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Conference site

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