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タイトル
和文: 
英文:Nonvolatile SRAM architecture using MOSFET-based spin-transistors 
著者
和文: Yusuke Shuto, 山本 修一郎, 菅原 聡.  
英文: Yusuke Shuto, Shuu'ichirou Yamamoto, Satoshi Sugahara.  
言語 English 
掲載誌/書名
和文: 
英文:J. Appl. Phys. 
巻, 号, ページ Vol. 105        pp. 07C933/1-3
出版年月 2009年 
出版者
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英文: 
会議名称
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英文: 
開催地
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DOI https://doi.org/10.1063/1.3076895
アブストラクト The authors proposed and computationally analyzed nonvolatile static random access memory (NV-SRAM) architecture using a new type of spin transistor comprised of a metal-oxide-semiconductor field-effect transistor (MOSFET) and magnetic tunnel junction (MTJ) that is referred to as a pseudo-spin-MOSFET (PS-MOSFET). The PS-MOSFET is a circuit approach to reproduce the functions of spin transistors, based on recently progressed magnetoresistive random access memory technology. The proposed NV-SRAM cell can be simply configured by connecting two PS-MOSFETs to the storage nodes of a standard SRAM cell.

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