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英文:Epitaxial growth of ZnO films on lattice-matched ScAlMgO4(0001) substrates 
著者
和文: 田村 謙太郎, 大友 明, 七種 耕治, 逢坂 陽子, 牧野 哲征, 瀬川 勇三朗, 角谷 正友, 福家 俊郎, 鯉沼 秀臣, 川崎 雅司.  
英文: K. Tamura, A. Ohtomo, K. Saikusa, Y. Osaka, T. Makino, Y. Segawa, M. Sumiya, S. Fuke, H. Koinuma, M. Kawasaki.  
言語 English 
掲載誌/書名
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英文:Journal of Crystal Growth 
巻, 号, ページ Vol. 214        pp. 59-62
出版年月 2000年6月 
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公式リンク <Go to ISI>://000087873200015
 
DOI https://doi.org/10.1016/S0022-0248(00)00059-2
アブストラクト The use of lattice-matched (0.09%) hxagonal oxide substrate, ScAlMgO4, has considerably improved the quality of ZnO films grown by laser molecular-beam epitaxy. Surface morphology was extremely smooth as represented by atomically Bat terraces and 0.26 nm high steps corresponding to the charge neutral unit of ZnO. Crystallinity was comparable to that of bulk single crystals: full-width at half-maximum value of ZnO(0 0 0 2) rocking curve was 39 arcsec. Optical absorption spectra showed clear splitting of A- and B-exciton lines, indicating low damping. Residual carrier concentration in pristine films was as low as 10(15) cm(-3) with keeping high electron mobility of similar to 100 cm(2)/Vs. Therefore, the ZnO films grown on ScAlMgO4(0001) substrates can be a starting point for realizing p-type ZnO. In fact, high concentration (similar to 10(21) cm(-3)) nitrogen can be doped with keeping high crystallinity.

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