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タイトル
和文: 
英文:Preparation of Narrow-gap a-Si:H Solar Cells by VHF-PECVD Technique 
著者
和文: Kim Do Yun, イサヌル アフデイ, 笠嶋 俊介, 宮島 晋介, 小長井 誠.  
英文: Do Yun Kim, Ihsanul Afdi Yunaz, Shunsuke Kasashima, Shinsuke Miyajima, Makoto Konagai.  
言語 English 
掲載誌/書名
和文: 
英文:MRS Proceedings 
巻, 号, ページ Volume 1245       
出版年月 2010年4月 
出版者
和文: 
英文: 
会議名称
和文: 
英文:2010 MRS Spring Meeting 
開催地
和文: 
英文: 
公式リンク http://www.mrs.org/s_mrs/sec_subscribe.asp?CID=26234&DID=323801&action=detail
 
DOI https://doi.org/10.1557/PROC-1245-A07-07
アブストラクト Optical, electrical and structural properties of silicon films depending on hydrogen flow rate (RH), substrate temperature (TS), and deposition pressure (PD) were investigated. By decreasing RH and increasing TS and PD, the optical band gap (Eopt) of silicon thin films drastically declined from 1.8 to 1.63 eV without a big deterioration in electrical properties. We employed all the investigated Si thin films for p-i-n structured solar cells as absorbers with i-layer thickness of 300 nm. From the measurement of solar cell performances, it was clearly observed that spectral response in long wavelength was enhanced as Eopt of absorber layers decreased. Using the solar cell whose Eopt of i-layer was 1.65 eV, the highest QE at long wavelength with the short circuit current density (Jsc) of 16.34 mA/cm2 was achieved, and open circuit voltage (Voc), fill factor (FF), and conversion efficiency (?) were 0.66 V, 0.57, and 6.13%, respectively.

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