Etching of SiO2 Film by Synchrotron Radiation in Hydrogen and its Application to Low Temperature Surface Cleaning

論文・著書情報

タイトル

和文:
英文:	Etching of SiO2 Film by Synchrotron Radiation in Hydrogen and its Application to Low Temperature Surface Cleaning

著者

和文:	伊藤隆司.
英文:	Takashi Ito.

言語

English

掲載誌/書名

和文:
英文:	Proceeding of New Aspects of Photon Induced Processes on Surfaces, First International Forum of Optoelectronics Industry

巻, 号, ページ

p. 86

出版年月

1991年

出版者

和文:
英文:

会議名称

和文:
英文:	Proceeding of New Aspects of Photon Induced Processes on Surfaces, First International Forum of Optoelectronics Industry

開催地

和文:
英文:	Okinawa