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タイトル
和文: 
英文:Epitaxial structure and electronic property of β-Ga2O3 films grown on MgO (100) substrates by pulsed-laser deposition 
著者
和文: 若林諒, 吉松 公平, 服部真依, 大友 明.  
英文: Ryo Wakabayashi, K. Yoshimatsu, Mai Hattori, A. Ohtomo.  
言語 English 
掲載誌/書名
和文: 
英文:Applied Physics Letters 
巻, 号, ページ Vol. 111        162101
出版年月 2017年10月17日 
出版者
和文: 
英文:AIP Publishing 
会議名称
和文: 
英文: 
開催地
和文: 
英文: 
公式リンク http://aip.scitation.org/doi/abs/10.1063/1.4990779
 
DOI http://dx.doi.org/10.1063/1.4990779
アブストラクト We investigated heteroepitaxial growth of Si-doped Ga2O3 films on MgO (100) substrates by pulsed-laser deposition as a function of growth temperature (Tg) to find a strong correlation between the structural and electronic properties. The films were found to contain cubic γ-phase and monoclinic β-phase, the latter of which indicated rotational twin domains when grown at higher Tg. The formation of the metastable γ-phase and twin-domain structure in the stable β-phase are discussed in terms of the in-plane epitaxial relationships with a square MgO lattice, while crystallinity of the β-phase degraded monotonically with decreasing Tg. The room-temperature conductivity indicated a maximum at the middle of Tg, where the β-Ga2O3 layer was relatively highly crystalline and free from the twin-domain structure. Moreover, both crystallinity and conductivity of β-Ga2O3 films on the MgO substrates were found superior to those on α-Al2O3 (0001) substrates. A ratio of the conductivity, attained to the highest quantity on each substrate, was almost three orders of magnitude.

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