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タイトル
和文: 
英文:Effect of Metastable Quenching by Oxygen Admixture on Excited-State Populations of Low-Pressure Ar Plasma 
著者
和文: 土谷裕介, 根津篤, 赤塚洋.  
英文: Yusuke Tsuchiya, Atsushi Nezu, Hiroshi Akatsuka.  
言語 English 
掲載誌/書名
和文: 
英文:Proceedings of 42nd International Symposium on Dry Process 
巻, 号, ページ         pp. 59-60
出版年月 2021年11月18日 
出版者
和文: 
英文:Program Committee of 42nd International Symposium on Dry Process 
会議名称
和文: 
英文:42nd International Symposium on Dry Process 
開催地
和文: 
英文: 
公式リンク http://www.dry-process.org/2021/poster_program.html
 
アブストラクト To examine the possibility of OES measurement of electron etemperature and density of low-pressure discharge Ar-O2 mixture plasmas, the effect of quenching of argon metastable states by collisions with oxygen molecules is discussed using the collisional-radiative model of argon plasma. It was confirmed that not only the metastable level but also the density of other excited states decreased as the O2 mixing rate increased. However, it was found that the effect differs depending on the level.

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