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タイトル
和文: 
英文:Evaluation method of plasma fluctuation using stochastic model 
著者
和文: 島田陽介, 赤塚洋.  
英文: Yosuke Shimada, Hiroshi Akatsuka.  
言語 English 
掲載誌/書名
和文: 
英文:Proceedings of 44th International Symposium on Dry Process (DPS2023) 
巻, 号, ページ         pp. 93-94
出版年月 2023年11月20日 
出版者
和文: 
英文:Organizing Committee of 44th International Symposium on Dry Process 
会議名称
和文: 
英文:44th International Symposium on Dry Process (DPS2023) 
開催地
和文:名古屋 
英文:Nagoya 
公式リンク http://www.dry-process.org/2023/poster_program.html
 
アブストラクト Recently, fluctuation of plasma has been discussed not only in field of nuclear fusion but also semiconductor etching. New evaluation method is proposed using stochastic model for prediction of plasma fluctuation based on collisional-radiative model. Electron impact excitation of atoms is considered as a Wiener process. Revised Wiener process is applied to analyze change of densities of excited-level populations in short time by Malliavin derivative. By using this method, the density fluctuation is evaluated from the view point of contribution of electron collision

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