In Recent years, non-equilibrium plasma has widely attracted much attention in short-time duration
phenomenon. For example, fluctuation of plasma is related to it, and consequently, it has been discussed not
only in field of nuclear fusion but also semiconductor etching. Evaluation method has already been proposed
using Malliavin derivative for prediction of plasma fluctuation based on collisional-radiative model. When
revised Wiener process is applied to analyze change in densities of excited-level populations in short time,
asymptotic stability of average two-square and globally stochastic asymptotic stability of equilibrium
solution are important for transient behavior of non-equilibrium plasma. By this method, the density
fluctuation about transient behavior may be controlled
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