"Chunfu LIN,Takashi TANAKA,Akio NISHIYAMA,Tadashi SHIOTA,Osamu SAKURAI,Naoki WAKIYA,Kazuo SHINOZAKI,Kouichi YASUDA","Effect of deposition conditions and buffer layers on amorphous or polytype phase formation in Al2O3 thin films by chemical vapor deposition using tri-methyl aluminum",,"J. Ceram. Soc. Japan","The Ceramic Society of Japan","Vol. 127","No. 6","pp. 443-450",2019,June
"Akio Sayano,Tadashi Shiota,Akio Nishiyama,Kouichi Yasuda,Kazuo Shinozaki","Apparent zeta potential of nano-porous Al2O3 film deposited on different substrates in streaming potential method",,"Journal of Materials Science","Springer","Vol. 53","  Issue 24","pp. 16232-16242",2018,Aug.
"Morgan Lin,Akio Nishiyama,Tadashi SHIOTA,KOUICHI YASUDA,KAZUO SHINOZAKI","Al(CH3)3とO2を用いたMOCVD 法によるAl2O3製膜に及ぼすH2添加の影響","日本セラミックス協会2018年年会","日本セラミックス協会2018年年会要旨集",,,,,2018,Mar.
"Tadashi Shiota,Yuko Mori,Jun Sugiyama,Osamu Sakurai,Akio Nishiyama,Naoki Wakiya,Sumitaka Tachikawa,Kazuo Shinozaki","Preparation of (La1-xSrx)MnO3 (- delta) thin films on Si (100) substrates by a metal-organic decomposition method for smart radiation devices",,"Thin Solid Films",,"Vol. 626",,"pp. 154-158",2017,Mar.
"Tadashi SHIOTA,Akio Nishiyama,osamu sakurai,KAZUO SHINOZAKI","Resistive switching and conductance quantization in oxide thin films","第26回日本MRS年次大会","第26回日本MRS年次大会 abstract",,,,,2016,Dec.
"Kazuto Nagahara,Syun Kinouchi,Tadashi Shiota,Akio Nishiyama,Osamu Sakurai,Kazuo Shinozaki","Rate-Determining Steps of Electrode Reaction on (La,Sr)(Co,Ni)O3 Thin Films at Low Temperatures","AMEC-2016 (The 10th Asian Meeting on Electroceramics)","AMEC 2016 program and abstract book",,,,"  166",2016,Dec.
"Tadashi SHIOTA,Ryo Shirata,Koshi Futatsumori,Akio Nishiyama,osamu sakurai,KAZUO SHINOZAKI","Resistive switching in Y2O3-stabilized ZrO2 thin films deposited on Si substrates by PLD","第36回エレクトロセラミックス研究討論会","第36回エレクトロセラミックス研究討論会講演予稿集",,,,,2016,Oct.
"Tadashi SHIOTA,Tomoya Kubo,Akio Nishiyama,osamu sakurai,KAZUO SHINOZAKI","Relationship between microstructure and conductance quantization in resistive switching in TaOx thin films","第77回応用物理学会秋季学術講演会",,"日本応用物理学会",,,,2016,Sept.
"Hiroshi Kobayashi,osamu sakurai,Akio Nishiyama,Jeffrey Scott Cross,Tadashi SHIOTA,KAZUO SHINOZAKI,naoki wakiya","Fabrication of porous substrate for oxide-ion-conductor thin film by direct forming method","日本セラミックス協会2016年年会","日本セラミックス協会2016年年会講演予稿集",,,,,2016,Mar.
"Kosuke Suito,osamu sakurai,Tadashi SHIOTA,naoki wakiya,Jeffrey Scott Cross,Akio Nishiyama,KAZUO SHINOZAKI","Electrical properties of Gd2O3 doped CeO2 thin films on anodic alumina substrate","日本セラミックス協会2016年年会","日本セラミックス協会2016年年会講演予稿集",,,,,2016,Mar.
"Tomoya Kubo,Ryo Shirata,Hiroaki Minami,Tadashi SHIOTA,Akio Nishiyama,osamu sakurai,KAZUO SHINOZAKI","Effect of microstructure on Conductance Quantization in Ta2O5 thin films for RRAM","日本セラミックス協会2016年年会","日本セラミックス協会2016年年会講演予稿集",,,,,2016,Mar.
"Kazuto Nagahara,Tadashi SHIOTA,Akio Nishiyama,naoki wakiya,Jeffrey Scott Cross,osamu sakurai,KAZUO SHINOZAKI","The Effect of Composition of (La,Sr)(Co,Ni)O3 Thin Film Electrodes on Electrical Property for Intermediate-Temperature Solid Oxide Fuel Cells","電気化学会第８３回大会","電気化学会第８３回大会講演要旨集",,,,,2016,Mar.
"osamu sakurai,Yuko Mori,Ayato Watase,Tadashi SHIOTA,Akio Nishiyama,KAZUO SHINOZAKI,Naoki Wakiya,Shintaro Higashi,Sumitaka Tachikawa","化学溶液堆積法を用いて Si 基板上に作 製した(La1-xSrx)MnO3-δ薄膜の熱放射率","第36回日本熱物性シンポジウム","第36回日本熱物性シンポジウム予稿集",,,,,2015,Oct.
"Kazuto Nagahara,Tadashi SHIOTA,Akio Nishiyama,naoki wakiya,Jeffrey Scott Cross,osamu sakurai,KAZUO SHINOZAKI","(La,Sr)(Co,Ni)O3-δ電極を用いたYSZ酸素センサの低温動作に及ぼす電解質薄膜化の影響","電気化学第82回大会","電気化学第82回大会講演要旨集",,,,"  1N18",2015,Mar.
"Atsushi Tanaka,Takahiro Utsugi,Akio Nishiyama,naoki wakiya,Tadashi SHIOTA,osamu sakurai,KAZUO SHINOZAKI","Al(CH3)3を原料とするMOCVD法によるα−Al2O3薄膜の製膜条件の最適化","日本セラミックス協会2014年年会","日本セラミックス協会2014年年会講演予稿集",,,,"  2G28",2015,Mar.
"Hiroshi Kobayashi,osamu sakurai,Akio Nishiyama,Jeffrey Scott Cross,Tadashi SHIOTA,KAZUO SHINOZAKI,Naoki Wakiya","直接発泡法による薄膜固体酸化物型燃料電池用多孔質基板の作製","日本セラミックス協会2015年年会","日本セラミックス協会2015年年会講演予稿集",,,,"  1P178",2015,Mar.
"Ayato Watase,Yuko Mori,Tadashi SHIOTA,Akio Nishiyama,Naoki Wakiya,Jeffrey Scott Cross,osamu sakurai,KAZUO SHINOZAKI,Sumitaka Tachikawa","RFマグネトロンスパッタリング法によりSi基板上に製膜した熱放射率可変材料(La1-xSrx)MnO3-d薄膜の評価","第35回日本熱物性シンポジウム","第35回日本熱物性シンポジウム講演論文集",,,,"  C101",2014,Nov.
"Yuko Mori,Ayato Watase,Tadashi SHIOTA,Akio Nishiyama,Jeffrey Scott Cross,osamu sakurai,KAZUO SHINOZAKI,naoki wakiya,東慎太郎,Sumitaka Tachikawa","化学溶液堆積法を用いて Si 基板上に作製した(La1-xSrx)MnO3-δ 薄膜の製膜条件と熱放射率の関係","第35回日本熱物性シンポジウム","第35回日本熱物性シンポジウム講演論文集",,,,"  C102",2014,Nov.
"Morgan Lin,A. Tanaka,A. Nishiyama,T. Shiota,osamu sakurai,K. Shinozaki","Fabrication of a-Al2O3 thin films at lower temperature by low pressure MOCVD","第4回日本セラミックス協会関東支部若手研究発表交流会","第4回日本セラミックス協会関東支部若手研究発表交流会講演要旨集",,,,"  43",2014,Oct.
"Kazuto Nagahara,Tadashi SHIOTA,Akio Nishiyama,naoki wakiya,Jeffrey Scott Cross,osamu sakurai,KAZUO SHINOZAKI","YSZの低インピーダンス化と(La,Sr)(Co,Ni)O3-d薄膜電極を用いた低温駆動酸素センサの作製と評価","第4回日本セラミックス協会関東支部若手研究発表交流会","第4回日本セラミックス協会関東支部若手研究発表交流会講演要旨集",,,,"  41",2014,Oct.
"Yuko Mori,Ayato Watase,Tadashi SHIOTA,Akio Nishiyama,Jeffrey Scott Cross,osamu sakurai,KAZUO SHINOZAKI,naoki wakiya,東慎太郎,Sumitaka Tachikawa","化学溶液堆積法を用いた Si 基板上での(La1-xSrx)MnO3-δ 薄膜の作製","日本セラミックス協会第30回関東支部研究発表会","日本セラミックス協会第30回関東支部研究発表会講演予稿集",,,,"  B14",2014,Sept.
"Ayato Watase,Yuko Mori,Tadashi SHIOTA,Akio Nishiyama,naoki wakiya,Jeffrey Scott Cross,osamu sakurai,KAZUO SHINOZAKI,Sumitaka Tachikawa","RFマグネトロンスパッタリング法による(La,Sr)MnO3薄膜の金属−絶縁体相転移温度に及ぼす組成の影響","日本セラミックス協会第27回秋季シンポジウム","日本セラミックス協会第27回秋季シンポジウム講演予稿集",,,,,2014,Sept.
"Takahiro Utsugi,Atsushi Tanaka,Akio Nishiyama,Tadashi SHIOTA,osamu sakurai,KAZUO SHINOZAKI,naoki wakiya","PLD 法を用いたCr2O3シード層の製膜と MOCVD 法によるAl2O3薄膜の結晶化への影響","日本セラミックス協会第30回関東支部研究発表会","日本セラミックス協会第30回関東支部研究発表会講演予稿集",,,,"  B13",2014,Sept.
"Lin,A. Tanaka,N. Ishizaki,A. Nishiyama,N. Wakiya,J. S. Cross,T. Shiota,O. Sakurai,K. Shinozaki","Optimization of Deposition Conditions of a-Al2O3 Thin Films by Low Pressure MOCVD Using Al(CH3)3","The 8th International Conference on the Science and Technology for Advanced Ceramics (STAC-8)","Abstract book of The 8th International Conference on the Science and Technology for Advanced Ceramics (STAC-8)",,,,"  26pKP27",2014,June
"H. Kobayashi,O. Sakurai,A. Nishiyama,N. Wakiya,J. S.Cross,T. Shiota,K. Shinozaki","Fabrication of macroporous Ceramics by Direct Foaming Method","The 8th International Conference on the Science and Technology for Advanced Ceramics (STAC-8)","Abstract book of The 8th International Conference on the Science and Technology for Advanced Ceramics (STAC-8)",,,,"  25pKP17",2014,June
"Kazuto Nagahara,Tadashi SHIOTA,Akio Nishiyama,naoki wakiya,Jeffrey Scott Cross,osamu sakurai,KAZUO SHINOZAKI","YSZ酸素センサの低温駆動を目指した(La,Sr,)(Co,Ni)O3-δ薄膜電極の作製と評価","電気化学会第81回大会","電気化学会第81回大会講演要旨集",,,,,2014,Mar.
"K. Shinozaki,Y. Arai,S. Sato,T. Hara,T. Shiota,N. Wakiya,J. Cross,A. Nishiyama,O. Sakurai","Properties of Adsorption Type Gas Sensor using Oxide Epitaxial Thin Films","26th Fall Meeting of the Ceramic Society of Japan","日本セラミックス協会第26回秋季シンポジウム講演予稿集",,,,"  2F04",2013,Sept.
"Atsushi Tanaka,Takahiro Utsugi,Noriya Ishizaki,Akio Nishiyama,Tadashi Shiota,Osamu Sakurai,Kazuo Shinozaki,Naoki Wakiya","Growth process of Al<sub>2</sub>O<sub>3</sub> thin films deposited by MOCVD using Al(CH<sub>3</sub>)<sub>3</sub>","日本セラミックス協会第29回関東支部研究発表会","日本セラミックス協会第29回関東支部研究発表会予稿集",,,,"  2A04",2013,Sept.
"Noriya Ishizaki,Atsushi Tanaka,Akio Nishiyama,Tadashi SHIOTA,osamu sakurai,KAZUO SHINOZAKI,naoki wakiya","Fabrication of alumina thin films on Si substrate by MOCVD","The 32nd Electronics Division Meeting of the Ceramic Society of Japan","日本セラミックス協会第32回エレクトロセラミックス研究討論会講演予稿集",,,"  2P10","p. 50",2012,Oct.