"A. Ohtomo,Hisanori Mashiko,Mifuyu Niwa,Hikaru Kurokawa,Kohei Yoshimatsu","Electrochemically active metal-oxide devices","European Advanced Energy Materials and Technology Congress",,,,,,2018,Mar.
"K. Yoshimatsu,M. Niwa,H. Mashiko,T. Oshima,A. Ohtomo","Reversible superconductor-insulator transition in LiTi<sub>2</sub>O<sub>4</sub> induced by Li-ion electrochemical reaction",,"Scientific Reports","Macmillan Publishers Limited","Vol. 5","  16325",,2015,Nov.
"T. Oshima,M. Niwa,K. Yokoyama,A. Ohtomo","Pulsed-laser deposition of superconducting LiTi<sub>2</sub>O<sub>4</sub>  ultrathin films",,"Journal of Crystal Growth","Elsevier","Volume 419",,"Page 153-157",2015,Mar.
"相馬 拓人,吉松 公平,丹羽 三冬,大島 孝仁,大友 明","電気化学的Li挿入によるWO<sub>3</sub>エピタキシャル薄膜の金属化","第62回応用物理学会春季学術講演会",,,,,,2015,Mar.
"丹羽 三冬,吉松 公平,大島 孝仁,大友 明","Li脱挿入によるLiTi<sub>2</sub>O<sub>4</sub>超伝導-絶縁状態間の可逆的スイッチング","第75回応用物理学会秋季学術講演会",,,,,,2014,Sept.
"M. Niwa,A. Mukai,T. Oshima,T. Nagami,T. Suyama,A. Ohtomo","Epitaxial growth of ZnGa<sub>2</sub>O<sub>4</sub> films by mist chemical vapor deposition","The Eighth International Conference on the Science and Technology for Advanced Ceramics",,,,,,2014,June
"T. Oshima,M. Niwa,A. Mukai,T. Nagami,T. Suyama,A. Ohtomo","Epitaxial growth of wide-band-gap ZnGa<sub>2</sub>O<sub>4</sub> films","The 41th International Symposium on Compound Semiconductor",,,,,,2014,May
"T. Oshima,M. Niwa,A. Mukai,T. Nagami,T. Suyama,A. Ohtomo","Epitaxial growth of wide-band-gap ZnGa<sub>2</sub>O<sub>4</sub> films by mist chemical vapor deposition",,"Journal of Crystal Growth","Elsevier","Volume 386",,"Page 190-193",2014,Jan.
"大島 孝仁,中園 敦巳,丹羽 三冬,向井 章,大友 明","ワイドギャップガリウム系酸化物薄膜のエピタキシャル成長と物性","TIESテクニカルミーティング",,,,,,2013,Oct.
"丹羽 三冬,向井 章,大島 孝仁,長見 知史,須山 敏尚,大友 明","ミストCVD法によるZnGa<sub>2</sub>O<sub>4</sub>薄膜のエピタキシャル成長","第74回応用物理学会秋季学術講演会",,,,,,2013,Sept.
"横山 耕祐,丹羽 三冬,大島 孝仁,大友 明","パルスレーザ堆積法によるLiTi<sub>2</sub>O<sub>4</sub> 薄膜のエピタキシャル成長","第73回秋季応用物理学会学術講演会",,,,,,2012,Sept.