"�²�X–Ø’¼�l,”¼“ß�ƒˆê","Si2H6-F2Œn”½‰ž�«CVD–@‚É‚æ‚éa-Si”––Œ‚ÆTFT‚Ì�ì�»","‘æ69‰ñ‰ž—p•¨—�Šw‰ïŠw�p�u‰‰‰ï","‘æ69‰ñ‰ž—p•¨—�Šw‰ïŠw�p�u‰‰‰ï�u‰‰—\�e�W",,,,,2008,Sept.
"Naoto Sasaki,Jun-ichi Hanna","Role of halogen in low-temperature growth of polycrystalline thin films by reactive thermal CVD",,"Journal of Non-Crystalline Solids",,"Vol. 354","No. 18-25","pp. 2079-2082",2008,June
"N. Sasaki,. Lim, J,. Hanna","Role of halogen in low-temperature growth of polycrystalline thin films by reactive thermal CVD",,"J. Non-Cryst. Solids",,"Vol. 354",,"p. 2079",2008,Feb.
"N. Sasaki,C. Lim,J. Hanna","Role of halogen in low-temperature growth of polycrystalline thin films by reactive thermal CVD","22nd International Conference on Amorphous and Nanocrystalline Semiconducto",,,,,,2007,Aug.