"Keisuke Ide,Mitsuho Kikuchi,Masato Ota,Masato Sasase,Hidenori Hiramatsu,Hideya Kumomi,Hideo Hosono,Toshio Kamiya","Effects of working pressure and annealing on bulk density and nanopore structures in amorphous In?Ga?Zn?O thin-film transistors",,"Jpn. J. Appl. Phys.",,"Vol. 56",,"pp. 03BB03-1 - 5",2017,Jan.
"K.Ide,M. Kikuchi,M. Sasase,H. Hiramatsu,H. Kumomi,H. Hosono,T. Kamiya","Why high-pressure sputtering must be avoided to deposit a-In-Ga-Zn-O films",,"; Proc. Active-Matrix Flatpanel Displays and Devices (AMFPD2016) (2016 The 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices)",,"Vol. 7-2/298-301",,"  7-2/298-301",2017,