"Yoshiro Kumagai,Satoshi Fukuyama,Hiroki Tonegawa,Kizashi Mikami,Kodai Hirose,Kanta Tomizawa,Kensuke Ichikawa,Masahiro Watanabe","Negative differential resistance of CaF2/Si double barrier resonant tunneling diodes fabricated using plasma etching mesa isolation process",,"Japanese Journal of Applied Physics","The Japan Society of Applied Physics","vol. 59",," SIIE03-1",2020,Apr.
"佐藤 穂波,熊谷 佳郎,三上 萌,利根川 啓希,廣瀬 皓大,冨澤 勘太,金子 拓海,渡辺 正裕","Si/CaF2 p型三重障壁共鳴トンネルダイオードの室温微分負性抵抗特性","第67回応用物理学会春季学術講演会",,"応用物理学会",,,"p. 11-139",2020,Mar.
"金子 拓海,熊谷 佳郎,廣瀬 皓大,利根川啓希,三上 萌,冨澤 勘太,佐藤穂波,渡辺正裕","CaF2/Si/CaF2共鳴トンネル量子井戸構造を用いた抵抗スイッチング特性の理論解析","第67回応用物理学会春季学術講演会",,"応用物理学会",,,"p. 11-140",2020,Mar.
"Yoshiro Kumagai,Satoshi Fukuyama,Hiroki Tonegawa,Kizashi Mikami,Kodai Hirose,Kanta Tomizawa,Keisuke Ichikawa,Masahiro Watanabe","Negative Differential Resistance in CaF2/Si Double Barrier Resonant Tunneling Diodes via Plasma Etching Mesa Isolation process","32nd International Microprocesses and Nanotechnology Conference (MNC2019)",,"The Japan Society of Applied Physics",,,,2019,Oct.
"三上 萌,熊谷 佳郎,廣瀬 皓大,冨澤 勘太,利根川 啓希,金子 拓海,佐藤 穂波,渡辺 正裕","原子層薄膜CaF2/Siヘテロ構造を用いたホール駆動共鳴トンネルダイオードの室温微分負性抵抗特性","第80回応用物理学会学術講演会",,"応用物理学会",,,"p. 12-342",2019,Sept.
"利根川 啓希,熊谷 佳郎,三上 萌,廣瀬 皓大,冨澤 勘太,金子 拓海,佐藤 穂波,渡辺 正裕","Si/CaF2三重障壁共鳴トンネルダイオードの高ピーク電流密度を有する室温微分負性抵抗特性","第80回応用物理学会学術講演会",,"応用物理学会",,,"p. 12-340",2019,Sept.
"冨澤 勘太,熊谷 佳郎,利根川 啓希,三上 萌,廣瀬 皓大,金子 拓海,佐藤 穂波,渡辺 正裕","CaF2/Si/SiO2二重障壁共鳴トンネルダイオードの室温微分負性抵抗特性","第80回応用物理学会学術講演会",,"応用物理学会",,,"p. 12-341",2019,Sept.
"三上 萌,福山 聡史,渡辺 正裕","原子層薄膜CaF2/Siヘテロ構造を用いたp 型共鳴トンネルダイオードの室温微分負性抵抗特性","第66回応用物理学会春季学術講演会",,"応用物理学会",,,"p. 11-192",2019,Mar.
"市川研佑,利根川啓希,廣瀬皓大,三上萌,福山聡史,熊谷佳郎,渡辺正裕","金属をエミッタとするシリコン/フッ化物多重障壁共鳴トンネルダイオードの理論解析","第66回応用物理学会春季学術講演会",,"応用物理学会",,,"p. 11-191",2019,Mar.