"T. Kato,T.Inamura,A.Sasaki,K.Aoki,K.Kakushima,Y.Kataoka,A. Nishiyama,N. Sugii,H.Wakabayashi,K. Tsutsui,K. Natori,H. Iwai","Thickness-dependent electrical characterization of β‐FeSi2","The Workshop on Future Trend of Nanoelectronics: WIMNACT 39",,,,,,2014,Feb.
"Taichi Inamura,Takafumi Katou,佐々木亮人,青木克明,Kuniyuki KAKUSHIMA,片岡好則,西山彰,Nobuyuki Sugii,Hitoshi Wakabayashi,KAZUO TSUTSUI,Kenji Natori,HIROSHI IWAI","A study on silicide semiconductors for high efficiency thin film photovoltaic devices","The Workshop on Future Trend of Nanoelectronics:WIMNACT 39",,,,,,2014,
"Hiroaki Imamura,Taichi Inamura,Kuniyuki KAKUSHIMA,Yoshinori Kataoka,Akira Nishiyama,Nobuyuki Sugii,Hitoshi Wakabayashi,KAZUO TSUTSUI,Kenji Natori,HIROSHI IWAI","Characterization of Thin NiSi2 Films by Stacked Silicidation Sputtering Process with Kr Gas","The Workshop on Future Trend of Nanoelectronics:WIMNACT 39",,,,,,2014,
"Takafumi Katou,Taichi Inamura,佐々木亮人,青木克明,Kuniyuki KAKUSHIMA,Yoshinori Kataoka,Akira Nishiyama,Nobuyuki Sugii,Hitoshi Wakabayashi,KAZUO TSUTSUI,Kenji Natori,HIROSHI IWAI","Electrical characteristic of b-FeSi2","The Workshop on Future Trend of Nanoelectronics:WIMNACT 39",,,,,,2014,
"稲村太一,嘉藤貴史,佐々木亮人,青木克明,角嶋邦之,片岡好則,西山彰,杉井信之,若林整,筒井一生,名取研二,岩井洋","β-FeSi2の抵抗率熱処理依存性","第61回応用物理学会春季学術講演会",,,,,,2014,
"嘉藤貴史,岩井洋,稲村太一","β-FeSi2の電気特性-膜厚依存性","第61回応用物理学会春季学術講演会",,,,,,2014,
"佐々木亮人,青木克明,片岡好則,小林 薫平,稲村太一,角嶋邦之,岩井洋","バリウムシリサイド半導体を用いたショットキー型太陽電池に関する研究","第61回応用物理学会春季学術講演会",,,,,,2014,
"Taichi Inamura,佐々木亮人,青木克明,Kuniyuki KAKUSHIMA,片岡好則,西山彰,Nobuyuki Sugii,Hitoshi Wakabayashi,KAZUO TSUTSUI,Kenji Natori,HIROSHI IWAI","A stacked sputtered process for β-FeSi2 formation","ECS 224nd Meeting","ECS Transactions",,,,,2013,Oct.
"Taichi Inamura,佐々木亮人,青木克明,Kuniyuki KAKUSHIMA,片岡好則,西山彰,Nobuyuki Sugii,Hitoshi Wakabayashi,KAZUO TSUTSUI,Kenji Natori,HIROSHI IWAI","A stacked sputtered process for β-FeSi2 formation","ECS 224nd Meeting","ECS Transactions",,,,,2013,Oct.
"Taichi Inamura,Kuniyuki KAKUSHIMA,パールハットアヘメト,片岡好則,Akira Nishiyama,Nobuyuki Sugii,KAZUO TSUTSUI,Kenji Natori,takeo hattori,HIROSHI IWAI","Formation of Fe-silicides using Multi-Stacking Sputtering Process","Workshop and IEEE EDS Mini-colloquium on Nanometer CMOS Technology (WIMNACT 37)",,,,,,2013,
"嘉藤貴史,稲村太一,佐々木 亮人,青木 克明,角嶋邦之,片岡好則,西山彰,杉井信之,若林整,筒井一生,名取研二,岩井洋","Fe層とSi層の積層スパッタにより形成されたβ-FeSi2のキャリア密度に関する研究","第74回応用物理学会秋季学術講演会",,,,,,2013,
"今村浩章,稲村太一,角嶋邦之,片岡好則,西山彰,杉井信之,若林整,筒井一生,名取研二,岩井洋","Krガスを用いた積層シリサイド化スパッタプロセスにより形成したNiSi2の薄膜評価","第74回応用物理学会秋季学術講演会",,,,,,2013,
"Taichi Inamura,Kuniyuki KAKUSHIMA,パールハットアヘメト,片岡好則,Akira Nishiyama,Nobuyuki Sugii,KAZUO TSUTSUI,Kenji Natori,takeo hattori,HIROSHI IWAI","Formation of Fe-silicides using Multi-Stacking Sputtering Process","Workshop and IEEE EDS Mini-colloquium on Nanometer CMOS Technology (WIMNACT 37)",,,,,,2013,