"Kiichi Tachi,M.Casse,D.Jang,C.Dupre,A.Hubert,N.Vulliet,C. Maffini-Alvaro,C. Vizioz,C. Carabasse,V. Delaye,J.M.Hartmann,G.Ghibaudo,HIROSHI IWAI,S. Cristoloveanu,O. Faynot,T.Ernst","Relationship between mobility and high-k interface properties in advanced Si and SiGe nanowires","IEDM 2009",,,,,,2009,Dec.