"Tadahiro Ohmi,Hiraku ISHIKAWA,Toshihisa NOZAWA,Takaaki MATSUOKA,Akinobu TERAMOTO,Masaki HIRAYAMA,Takashi ITO,Tadahiro OHMI","Evaluation of New Amorphous Hydrocarbon Film for Copper Barrier Dielectric Film in Low-k Copper Metallization",,"Japanese Journal of Applied Physics","The Japan Society of Applied Physics","Vol. 47","No. 4","pp. 2531?2534",2008,Apr.