"S.Morishita,T.Goto,I.Akutsu,K.Ohyama,T.Ito,T.Ohmi","High-Speed Gas Replacement in Plasma Process Chamber due to Precise Down-Flow of Gas Using a Upper Shower Plate","30th International Symposium on Dry Process","Dry Process International Symposium iDPS2008j","30th International Symposium on Dry Process",,,"pp. 63-64",2008,Nov.
"Sadaharu Morishita,Tetsuya Goto,Takashi Ito,Tadahiro Ohmi","Study on Gas Replacement Time in Plasma Process Chamber for Realizing Ideal Down Flow of Gas without Disturbance","Int. Symp. on Semicon. Manufacturing 2008 (ISSM2008)","Int. Symp. on Semicon. Manufacturing 2008 (ISSM2008)","Int. Symp. on Semicon. Manufacturing 2008 (ISSM2008)",,,"pp. 177-180",2008,Oct.