"Yasuo Nara,Yoshihiro Sugita,Noriaki Nakayama,Takashi Ito","Etching of Si02 Film by Synchrotron Radiation in Hydrogen and its Application to Low Temperature Surface Cleaning",,"Journal of Vaccum Science and Technology","AVS","Vol. B10",,"pp. 274-277",1992,Jan.
"Satoru Watanabe,Mayumi Shigeno,Noriaki Nakayama,Takashi Ito","Silicon Monohydride Termination of Silicon (111) Surface Formed by Boiling Water",,"Japanese Journal of Applied Physics","The Japan Society of Applied Phisics","Vol. 30","No. 12B","pp. 3575-3579",1991,Dec.
"Satoru Watanabe,Noriaki Nakayama,Takashi Ito","Homogeneous Hydrogen-Terminated Si(111) Surface Formed Using Aqueous HF Solution and Water",,"Applied Phisics Letters","American Institute of Physics","Vol. 59","No. 12","pp. 1458-1460",1991,Nov.
"Yasuo Nara,Yoshihiro Sugita,Noriaki Nakayama,Takashi Ito","Synchrotron Radiation Assisted Removal of Oxygen and Carbon Contaminants from a Silicon Surface",,"Japanese Journal of Applied Physics","The Japan Society of Applied Phisics","Vol. 30","No. 10A","pp. L1753-L1755",1991,Oct.
"Satoru Watanabe,Mayumi Shigeno,Noriaki Nakayama,Takashi Ito","Silicon Monohydride Termination of Silicon (111) Surface Formed by Boiling Water","Ext. Abst. of 1991 Int. Conf. on SSDM","Ext. Abst. of 1991 Int. Conf. on SSDM",,,,"pp. 502-503",1991,
"Satoru Watanabe,Noriaki Nakayama,Takashi Ito","Infrared Observation of Hydrogen-Terminated Silicon Surface with VUV Irradiation","Proceeding of New Aspects of Photon Induced Processes on Surfaces, First International Forum of Optoelectronics Industry","Proceeding of New Aspects of Photon Induced Processes on Surfaces, First International Forum of Optoelectronics Industry",,,,"p. 85",1991,