"”Ρ“ˆ q‘ε,’JŒϋ Œφ‘Ύ,‘ε’ΏG•v,_–μ δ»ˆί“ή,‰“Ό”όd,Ό’JWG,‘Ύ“c ‘Χ—F,Šβ–{ •q","ƒΏ-Ga2O3 “±”g˜Hμ»‚ΙŒό‚―‚½PECVD ¬–Œ a-C:H –Œ‚ΜAr ƒvƒ‰ƒYƒ}ƒGƒbƒ`ƒ“ƒN?‘ϐ«•]‰Ώ","2025 ”N‘ζ72 ‰ρ ‰ž—p•¨—Šw‰οt‹GŠwpu‰‰‰ο",,,,,"  16a-K403-2",2025,Mar.
"Akihiro Matsutani,Hideo Ohtsuki,FUMIO KOYAMA","Smooth and Vertical Profile Dry Etching of Si Using XeF2 Plasma",,"Japanese Journal of Applied Physics",,"vol. 48","no. 6S","pp. 06FE09-1-3",2009,June
"Akihiro Matsutani,Hideo Ohtsuki,FUMIO KOYAMA","Iodine Solid Source Inductively Coupled Plasma Etching of InP",,"Japanese Journal of Applied Physics",,"Vol. 44","No. 19","pp. L576-L577",2005,Apr.
"Ό’JWG,‘ε’Ξ G•v,¬ŽR“ρŽO•v,ˆΙ‰κŒ’ˆκ","Cl2/Xe—U“±Œ‹‡Œ^ƒvƒ‰ƒYƒ}(ICPj‚Ι‚ζ‚ιInP‚̐‚’Ό•½ŠŠƒhƒ‰ƒCƒGƒbƒ`ƒ“ƒO","‘ζ46‰ρt‹G‰ž—p•¨—Šw‰ο",,,"  28p-ZC-7",,,1999,Mar.