"K. Tuokedaerhan,Shuhei Hosoda,Kuniyuki KAKUSHIMA,�Љ��D��,���R��,Nobuyuki Sugii,Hitoshi Wakabayashi,KAZUO TSUTSUI,Kenji Natori,HIROSHI IWAI","Mobility Improvement of La-silicate MOSFET by W2C Gate Electrode","The Workshop on Future Trend of Nanoelectronics:WIMNACT 39","K. Tuokedaerhan, S. Hosoda, K. Kakushima, Y. Kataoka, A. Nishiyama, N. Sugii, H. Wakabayashi, K. Tsutsui, K. Natori, H. Iwai, �gMobility Improvement of La-silicate MOSFET by W2C Gate Electrode�h, The Workshop on Future Trend of Nanoelectronics:WIMNACT 39, February 7, 2014, Suzukake Hall, Suzukakedai Campus, Tokyo Institute of Technology, Japan",,,,,2014,