"Kazuaki Suzuki,T. Fujiwara,S.  Kojima,N. Hirayanagi,T. Yahiro,J. Udagawa,S. Shimizu,H. Yamamoto,M. Suzuki,H. Takekoshi,S. Fukui,M. Hamashima,J. Ikeda,T. Okino,H. Shimizu,S. Takahashi,A. Yamada,T. Umemoto,S. Katagiri,Y. Ohkubo,T. Shimoda,K. Hirose,T. Tanida,Y. Watanabe,T. Kaminaga,Y. Kohama,F. Mori,S. Takemoto,T. Yoshioka,H. Hirose,K. Morita,K. Hada,S. Kawata,T. Sato,Y. Sato,M. Tokunaga,K. Okamoto,Y. Kakizaki,T. Miura","First dynamic exposure results from an electron projection lithography tool",,"J. Vac. Sci. Technol. B","American Vacuum Society","Vol. 21","No. 6","pp. 2686-2690",2003,Dec.
"T. Okino,Kazuaki Suzuki,K. Okamoto,S. Kawata,K. Uchikawa,S. Suzuki,S. Shimizu,T. Fujiwara,A. Yamada,K. Kamijo","Investigation of proximy effect correction in electron projection lithography (EPL)","SPIE Microlithography","Proceeding of SPIE",,"Vol. 3997",,"pp. 235-244",2000,