"Yoshiro Kumagai,Satoshi Fukuyama,Hiroki Tonegawa,Kizashi Mikami,Kodai Hirose,Kanta Tomizawa,Kensuke Ichikawa,Masahiro Watanabe","Negative differential resistance of CaF<sub>2</sub>/Si double barrier resonant tunneling diodes fabricated using plasma etching mesa isolation process",,"Japanese Journal of Applied Physics","The Japan Society of Applied Physics","vol. 59",,"  SIIE03-1",2020,Apr.
"Yoshiro Kumagai,Satoshi Fukuyama,Hiroki Tonegawa,Kizashi Mikami,Kodai Hirose,Kanta Tomizawa,Keisuke Ichikawa,Masahiro Watanabe","Negative Differential Resistance in CaF<sub>2</sub>/Si Double Barrier Resonant Tunneling Diodes via Plasma Etching Mesa Isolation process","32nd International Microprocesses and Nanotechnology Conference (MNC2019)",,"The Japan Society of Applied Physics",,,,2019,Oct.
"ŽsěŒ¤—C,—˜ŞěŒ[Šó,œAŁáŠ‘ĺ,ŽOă–G,•ŸŽR‘Žj,ŒF’J‰Ŕ˜Y,“n•Ół—T","‹ŕ‘Ž‚đƒGƒ~ƒbƒ^‚Ć‚ˇ‚éƒVƒŠƒRƒ“^ƒtƒb‰ť•¨‘˝dá•Ç‹¤–ƒgƒ“ƒlƒ‹ƒ_ƒCƒI[ƒh‚Ě—˜_‰đÍ","‘ć66‰ń‰ž—p•¨—Šw‰ďt‹GŠwpu‰‰‰ď",,"‰ž—p•¨—Šw‰ď",,,"p. 11-191",2019,Mar.