"Akihiro Matsutani,Yuuki Hashidume,Hideo Ohtsuki,FUMIO KOYAMA","Microfabrication of Si-Based High-Index-Contrast-Grating Structure by Thermal Nanoimprint Lithography and Cl2/Xe-Inductively Coupled Plasma Etching",,"Jpn. J. Appl. Phys.",,"Vol. 51",,"  06FF05",2012,June
"Akihiro Matsutani,Yuuki Hashidume,Hideo Ohtsuki,Fumio Koyama","Si based High-index-contrast-grating Structure fabricated by High Temperature Cl2 Inductively Coupled Plasma Etching using Thermal Nanoimprint Resist Mask","24th International Microprocesses and Nanotechnology Conference, MNC2011",,,,"  26P-7-59",,2011,Oct.
"松谷 晃宏,橋爪 佑樹,Hideo Ohtsuki,小山 二三夫","ナノインプリントプロセスとCl2-ICPエッチングによるSi-HCGの製作と光学特性の評価",,"2011年秋季 第72回応用物理学会学術講演会",,,"  2a-ZJ-6",,2011,Aug.
"今村 明博,Weijian YANG,James Ferarra,橋爪 佑樹,顧 暁冬,小山 二三夫,Connie J. CHANG-HASNAIN","高屈折率差サブ波長格子中空光導波路を用いた空間モード分波器",,"2011年電子情報通信学会LQE研究会",,,"  LQE2011-41",,2011,Aug.
"松谷晃宏,橋爪佑樹,大槻秀夫,小山二三夫","ナノインプリントレジストをマスクに用いたCl2-ICP エッチングによるSi-HCG 構造の形成",,"春季第58回応用物理学関係連合講演会",,,"  26p-KN-9",,2011,Mar.
"Yuuki Hashidume,Akihiro Matsutani,Fumio Koyama","Fabrication of High Contrast Grating with  Nanoimprint Process",,"G-COE International Symposium",,,"  P-5",,2010,Mar.
"橋爪佑樹,松谷晃宏,小山二三夫","熱ナノインプリントを用いた高屈折率差サブ波長回折格子製作の検討",,"第57回応用物理学関係連合講演会",,,"  18p-P6-21",,2010,Mar.
"中島 純,橋爪 佑樹,坂口 孝浩,小山 二三夫","ナノインプリントプロセスを用いた中空導波路型波長可変ミラーの製作",,"第56回応用物理学関係連合講演会",,,"  2a-B-4","p. 1244",2009,Mar.
"橋爪佑樹,小山二三夫","FDTD法による高屈折率差サブ波長回折格子の解析",,"第56回応用物理学関係連合講演会",,,"  2a-B-8",,2009,Mar.