"寺岡 楓,今井 慎也,黒原 啓太,伊東 壮真,川那子 高暢,宗田 伊理也,角嶋 邦之,若林 整","Ni/Al2O3/スパッタWS2コンタクトの電流電圧特性","第84回応用物理学会秋季学術講演会",,,,,,2023,Sept.
"今井 慎也,梶川 亮介,川那子 高暢,宗田 伊理也,角嶋 邦之,辰巳 哲也,冨谷 茂隆,筒井 一生,若林 整","スパッタMoS2膜に対するエッジ金属コンタクトの電流電圧特性","第84回応用物理学会秋季学術講演会",,,,,,2023,Sept.
"Shinya Imai,Ryo Ono,Iriya Muneta,Kuniyuki Kakushima,Tetsuya Tatsumi,Shigetaka Tomiya,Kazuo Tsutsui,Hitoshi Wakabayashi","Grain-Size Enlargement of MoS2 Film by Low-Rate Sputtering with Molybdenum Grid","IEEE Electron Devices Technology and Manufacturing Conference (EDTM)",,,,,,2023,Mar.
"Ryo Ono,Shinya Imai,Takamasa Kawanago,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Tetsuya Tatsumi,Shigetaka Tomiya,Hitoshi Wakabayashi","Improvement of MoS2 Film Quality by Solid-Phase Crystallization from PVD Amorphous MoSx Film","IEEE Electron Devices Technology and Manufacturing Conference (EDTM)",,,,,,2023,Mar.
"今井 慎也,小野 凌,宗田 伊理也,角嶋 邦之,辰巳 哲也,冨谷 茂隆,筒井 一生,若林 整","MoS2膜質のスパッタ成膜レート依存性調査","第83回応用物理学会秋季学術講演会",,,,,,2022,Sept.
"小野 凌,今井 慎也,宗田 伊理也,角嶋 邦之,筒井 一生,若林 整","微結晶MoS2膜への硫黄雰囲気アニールによる結晶性向上","第83回応用物理学会秋季学術講演会",,,,,,2022,Sept.
"Ryo Ono,Shinya Imai,Yuta Kusama,Takuya Hamada,Masaya Hamada,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Emi Kano,Nobuyuki Ikarashi,Hitoshi Wakabayash","Elucidation of PVD MoS2 Film Formation Process and its Structure Focusing on Sub-Monolayer Region",,"Japanese Journal of Applied Physics (JJAP)",,"Vol. 61",,,2022,Feb.
"Ryo Ono,Shinya Imai,Yuta Kusama,Takuya Hamada,Masaya Hamada,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Nobuyuki Ikarashi,Hitoshi Wakabayashi","Growth Mechanism of PVD MoS2 Film from Sub-Monolayer Region","International Conference on Solid State Devices and Materials",,,,,,2021,Sept.
"Shinya Imai,Takuya Hamada,Masaya Hamada,Takanori Shirokura,Iriya Muneta,Kuniyuki Kakushima,Tetsuya Tatsumi,Shigetaka Tomiya,Kazuo Tsutsui,Hitoshi Wakabayashi","Importance of Crystallinity Improvement in MoS2 film just after MoS2-Compound Sputtering even followed by Post Sulfurization for Chip-Size Fabrication",,"Japanese Journal of Applied Physics (JJAP) （SSDM特集号）",,"Vol. 60",,"Page SBBH10",2021,Feb.
"Shinya Imai,Takuya Hamada,Masaya Hamada,Takanori Shirokura,Shigetaka Tomiya,Iriya Muneta,Kuniyuki Kakushima,Tetsuya Tatsumi,Kazuo Tsutsui,Hitoshi Wakabayashi","Importance of MoS2-Compound Sputtering even with Sulfur-Vapor Anneal for Chip-Size Fabrication","International Conference of Solid State Devices and Materials (SSDM) 2020",,,,,,2020,Sept.
"今井 慎也,濱田 昌也,五十嵐 智,宗田 伊理也,角嶋 邦之,筒井 一生,若林 整","硫化プロセスにおけるスパッタMoS2膜質向上の重要性","第80回応用物理学会秋季学術講演会",,,,,,2019,Sept.