"Takahiro Yamamoto,Kengo Igawa,Chun-Yi Chen,Tso-Fu Mark Chang,Takashi Nagoshi,Osamu Kudo,Ryu Maeda,Masato Sone","Micro-Mechanical Properties of Defect-Free Nickel Electrodeposited at a High Growth Rate toward MEMS Devices","44rd International Conference on Micro & Nano Engineering (MNE2018)","44rd International Conference on Micro & Nano Engineering (MNE2018)",,,,,2018,Sept.
"?本 貴?,井川 健吾,Chun-Yi Chen,Tso-Fu Mark Chang,名越 貴志,工藤 緯,前田 龍,曽根正人","スルファミン酸ハイスピード浴を?いて電気めっきしたニッケル膜の機械的特性に及ぼす電流密度の影響","応用物理学会第６５回春季講演会","応用物理学会第65回春季講演会",,,,,2018,Mar.