"H. Tanigawa,K. Matsuura,I. Muneta,T. Hoshii,K. Kakushima,K. Tsutsui,H. Wakabayashi","Positive Threshold Voltage in Accumulation Capacitance of TiN-Top-Gate/High-k/Sputtered-MoS2 Stacks","Int. Workshop on Dielectric Thin Films for Future Electron Devices -Science and Technology- (IWDTF2019)",,,,,,2019,Nov.
"五十嵐 智,望月 祐輔,谷川 晴紀,濱田 昌也,松浦 賢太朗,角嶋 邦之,筒井 一生,若林 整","スパッタMoS2膜とTiSi2膜の界面におけるFGアニールによるコンタクト抵抗低減","第80回応用物理学会秋季学術講演会",,,,,,2019,Sept.
"谷川 晴紀,松浦 賢太朗,宗田 伊理也,星井 拓也,角嶋 邦之,筒井 一生,若林 整","正の閾値電圧のMetal-Top-Gate/High-k/スパッタMoS2の蓄積容量特性","第80回応用物理学会秋季学術講演会",,,,,,2019,Sept.
"K. Matsuura,M. Hamada,T. Hamada,H. Tanigawa,T. Sakamoto,W. Cao,K. Parto,A. Hori,I. Muneta,T. Kawanago,K. Kakushima,K. Tsutsui,A. Ogura,K. Banerjee,H. Wakabayashi","Normally-Off Sputtered-MoS2 nMISFETs with MoSi2 Contact by Sulfur Powder Annealing and ALD Al2O3 Gate Dielectric for Chip Level Integration","Int. Workshop on Juction Technology (IWJT2019)",,,,,,2019,June
"松浦 賢太朗,濱田 昌也,坂本 拓朗,谷川 晴紀,宗田 伊理也,石原 聖也,角嶋 邦之,筒井 一生,小椋 厚志,若林 整","F.G.アニールによるMoSi2/スパッタMoS2界面コンタクト抵抗低減","第66回応用物理学会春期学術講演会",,,,,,2019,Mar.