"Yasuhisa Naitoh,Tatsuhiko Ohata,Ryuji Matsushita,Eri Okawa,Masayo Horikawa,Makiko Oyama,Masakazu Mukaida,Dong F Scott Wang,Manabu Kiguchi,Kazuhito Tsukagoshi,Takao Ishida","Self-Aligned Formation of Sub-1-nm-Gaps Utilizing Electromigration during Metal Deposition",,"ACS Appl. Mater. Interfaces",,"Vol. 5","  24","pp. 12869?12875",2013,Oct.
"‘ºˆä‘åŒß,’†�Z—F��,–ØŒûŠw,’ˉzˆê�m","Au’PŒ´Žq�Ú“_‚̈À’è�«‚Ö‚Ì•ªŽq‹z’…Œø‰Ê","“ú–{•¨—�Šw‰ï2013”N�H‹G‘å‰ï",,,,,,2013,