"Ryo Ono,Shinya Imai,Yuta Kusama,Takuya Hamada,Masaya Hamada,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Nobuyuki Ikarashi,Hitoshi Wakabayashi","Growth Mechanism of PVD MoS2 Film from Sub-Monolayer Region","International Conference on Solid State Devices and Materials",,,,,,2021,Sept.
"Takuya Hamada,Taiga Horiguchi,Masaya Hamada,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Tetsuya Tatsumi,Shigetaka Tomiya,Hitoshi Wakabayashi","Grain Size Enlargement in 2D WS2 Film with Low-Power RF-Magnetron Sputtering","Internatonal Conference on Solid State Devices and Materials",,,,,,2021,Sept.
"Takuya Hamada,Masaya Hamada,Satoshi Igarashi,Taiga Horiguchi,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Tetsuya Tatsumi,Shigetaka Tomiya,Hitoshi Wakabayashi","WS2 Film by Sputtering and Sulfur-Vapor Annealing, and its pMISFET with TiN/HfO2 Top-Gate Stack, TiN Bottom Contact, and Ultra-Thin Body and Box",,"Journal of the Electron Devices Society (J-EDS)",,"Vol. 9",,"p. 1117",2021,Aug.
"Masaya Hamada,Takuya Hamada,Kuniyuki Kakushima,Kazuo Tsutsui,Hitoshi Wakabayashi","Side-Contact Architecture for p/n-Stacked-Nano-Sheet ZrS2 2D-FETs Beyond 1-nm Technology Node","International Workshop on Junction Technology (IWJT2021)",,,,,,2021,June
"Shinya Imai,Takuya Hamada,Masaya Hamada,Takanori Shirokura,Iriya Muneta,Kuniyuki Kakushima,Tetsuya Tatsumi,Shigetaka Tomiya,Kazuo Tsutsui,Hitoshi Wakabayashi","Importance of Crystallinity Improvement in MoS2 film just after MoS2-Compound Sputtering even followed by Post Sulfurization for Chip-Size Fabrication",,"Japanese Journal of Applied Physics (JJAP) （SSDM特集号）",,"Vol. 60",,"Page SBBH10",2021,Feb.
"Masaya Hamada,Kentaro Matsuura,Takuya Hamada,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Hitoshi Wakabayashi","ZrS2 Symmetrical-Ambipolar FETs with Near-Midgap TiN Film for Both Top-Gate electrode and Schottky-Barrier Contact",,"Japanese Journal of Applied Physics (JJAP) （SSDM特集号）",,"Vol. 60",,"Page SBBH05",2021,Jan.
"Satoshi Igarashi,Yusuke Mochiduki,Haruki Tanigawa,Masaya Hamada,Kentaro Matsuura,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Hitoshi Wakabayashi","Self-Aligned-TiSi2 Bottom Contact with APM Cleaning and Post-annealing for Sputtered-MoS2 Film",,"Japanese Journal of Applied Physics (JJAP) （SSDM特集号）",,"Vol. 60",,"Page SBBH04",2021,Jan.
"Takuya Hamada,Shigetaka Tomiya,Tetsuya Tatsumi,Masaya Hamada,Taiga Horiguchi,Kuniyuki Kakushima,Kazuo Tsutsui,Hitoshi Wakabayashi","Sheet Resistance Reduction of MoS2 Film using Sputtering and Chlorine Plasma Treatment followed by Sulfur Vapor Annealing",,"Journal of the Electron Devices Society (J-EDS)",,"Vol. 9",,"Page 278-285",2021,Jan.