"Reika Ota,Shinnosuke Yasuoka,Ryoichi Mizutani,Takahisa Shiraishi,Kazuki Okamoto,Kuniyuki Kakushima,Tomoyuki Koganezawa,Osami Sakata,Hiroshi Funakubo","Scalable ferroelectricity of 20-nm-thick (Al0.8Sc0.2)N thin films sandwiched between TiN electrodes",,"J. Appl. Phys.",,"vol. 134",,"pp. 214103-1-6",2023,Dec.
"�¡ˆä �T–ç,Š��ì —º‰î,�ì“ߎq �‚’¨,�@“c ˆÉ—�–ç,Šp“ˆ –M”V,’C–¤ “N–ç,•y’J –Η²,“›ˆä ˆê�¶,Žá—Ñ �®","ƒXƒpƒbƒ^MoS2–Œ‚ɑ΂·‚éƒGƒbƒW‹à‘®ƒRƒ“ƒ^ƒNƒg‚Ì“d—¬“dˆ³“Á�«","‘æ84‰ñ‰ž—p•¨—�Šw‰ï�H‹GŠw�p�u‰‰‰ï",,,,,,2023,Sept.
"Š��ì —º‰î,�ì“ߎq �‚’¨,�@“c ˆÉ—�–ç,�¯ˆä ‘ñ–ç,Šp“ˆ –M”V,“›ˆä ˆê�¶,Žá—Ñ �®","ƒgƒbƒvƒQ�[ƒg‚ÉŽ©ŒÈ�®�‡‚µ‚½WOx S/D‚ð—p‚¢‚½30-50 nm–ŒŒúWSe2ƒoƒbƒNƒ`ƒƒƒlƒ‹pFET","‘æ84‰ñ‰ž—p•¨—�Šw‰ï�H‹GŠw�p�u‰‰‰ï",,,,,,2023,Sept.
"Ž›‰ª •–,�¡ˆä �T–ç,�•Œ´ Œ[‘¾,ˆÉ“Œ ‘s�^,�ì“ߎq �‚’¨,�@“c ˆÉ—�–ç,Šp“ˆ –M”V,Žá—Ñ �®","Ni/Al2O3/ƒXƒpƒbƒ^WS2ƒRƒ“ƒ^ƒNƒg‚Ì“d—¬“dˆ³“Á�«","‘æ84‰ñ‰ž—p•¨—�Šw‰ï�H‹GŠw�p�u‰‰‰ï",,,,,,2023,Sept.
"Ryosuke Kajikawa,Takamasa Kawanago,Iriya Muneta,Takuya Hoshii,Kuniyuki Kakushima,Kazuo Tsutsui,Hitoshi Wakabayashi","Self-Aligned WOx S/D Contacts to Gate Stacks with TiOx Nucleation Layer by Multiple-Deposition Method in WSe2 pFETs","International Conference on Solid State Devices and Materials",,,,,,2023,Sept.
"Iriya Muneta,Takanori Shirokura,Pham Nam Hai,Kuniyuki Kakushima,Kazuo Tsutsui,Hitoshi Wakabayashi","Ferromagnetism modulation by ultralow current in a two-dimensional polycrystalline molybdenum disulfide atomic layered structure","Intermag 2023",,,,,,2023,May
"à_“c �¹–ç,�¼‰Y Œ«‘¾˜N,à_“c ‘ñ–ç,�@“c ˆÉ—�–ç,Šp“ˆ –M”V,“›ˆä ˆê�¶,Žá—Ñ �®","ZrS2 symmetrical-ambipolar FETs with near-midgap TiN film for both top-gate electrode and Schottky-barrier contact","‘æ70‰ñ‰ž—p•¨—�Šw‰ï�t‹GŠw�p�u‰‰‰ï",,,,,,2023,Mar.
"Ryo Ono,Shinya Imai,Takamasa Kawanago,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Tetsuya Tatsumi,Shigetaka Tomiya,Hitoshi Wakabayashi","Improvement of MoS2 Film Quality by Solid-Phase Crystallization from PVD Amorphous MoSx Film","IEEE Electron Devices Technology and Manufacturing Conference (EDTM)",,,,,,2023,Mar.
"Shinya Imai,Ryo Ono,Iriya Muneta,Kuniyuki Kakushima,Tetsuya Tatsumi,Shigetaka Tomiya,Kazuo Tsutsui,Hitoshi Wakabayashi","Grain-Size Enlargement of MoS2 Film by Low-Rate Sputtering with Molybdenum Grid","IEEE Electron Devices Technology and Manufacturing Conference (EDTM)",,,,,,2023,Mar.
"Peilong Wang,Atsushi Hori,Iriya Muneta,Takamasa Kawanago,Kuniyuki Kakushima,Kazuo Tsutsui,Hitoshi Wakabayashi","Self-heating and Short-Channel Effect Immunity with Partial-Bottom-Dielectric-Isolation for Gate-All-Around Nano-Sheet FETs","70th JSAP Spring meeting",,,,,,2023,Mar.
"Masaki Otomo,Masaya Hamada,Ryo Ono,Iriya Muneta,Kuniyuki Kakushima,Kazuo Tsutsui,Hitoshi Wakabayashi","Chemical states of PVD-ZrS2 film underneath scaled high-k film with self-oxidized ZrO2 film as interfacial layer",,"Japanese Journal of Applied Physics","IOP Publishing","Vol. 62",,"p. SC1015",2023,Jan.