@article{CTT100736242,
  author = {Keisuke Ide and Mitsuho Kikuchi and Masato Ota and Masato Sasase and Hidenori Hiramatsu and Hideya Kumomi and Hideo Hosono and Toshio Kamiya},
  title = {Effects of working pressure and annealing on bulk density and nanopore structures in amorphous In–Ga–Zn–O thin-film transistors},
  journal = {Jpn. J. Appl. Phys.},
  year = 2017,
}

@article{CTT100736284,
  author = {K.Ide and M. Kikuchi and M. Sasase and H. Hiramatsu and H. Kumomi and H. Hosono and T. Kamiya},
  title = {Why high-pressure sputtering must be avoided to deposit a-In-Ga-Zn-O films},
  journal = {; Proc. Active-Matrix Flatpanel Displays and Devices (AMFPD2016) (2016 The 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices)},
  year = 2017,
}