論文

• Keisuke Ide, Mitsuho Kikuchi, Masato Ota, Masato Sasase, Hidenori Hiramatsu, Hideya Kumomi, Hideo Hosono, Toshio Kamiya. Effects of working pressure and annealing on bulk density and nanopore structures in amorphous In–Ga–Zn–O thin-film transistors, Jpn. J. Appl. Phys., Vol. 56, pp. 03BB03-1 - 5, Jan. 2017.
• K.Ide, M. Kikuchi, M. Sasase, H. Hiramatsu, H. Kumomi, H. Hosono, T. Kamiya. Why high-pressure sputtering must be avoided to deposit a-In-Ga-Zn-O films, ; Proc. Active-Matrix Flatpanel Displays and Devices (AMFPD2016) (2016 The 23rd International Workshop on Active-Matrix Flatpanel Displays and Devices), Vol. 7-2/298-301, 7-2/298-301, 2017.

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