@article{CTT100738469, author = {Yoriko Mizushima and Youngsuk Kim and Tomoji Nakamura and Akira Uedono and Takayuki Ohba}, title = {Behavior of copper contamination on backside damage for ultra-thin silicon three dimensional stacking structure}, journal = {Microelectronic Engineering}, year = 2017, } @article{CTT100738441, author = {Dote Aki and Kitada Hideki and Mizushima Yoriko and Nakamura Tomoji and Sakuyama Seiki}, title = {Analyzing and modeling methods for warpages of thin and large dies with redistribution layer}, journal = {Jpn. J. Appl. Phys.}, year = 2016, } @article{CTT100738462, author = {Mizushima Yoriko and Kim Youngsuk and Nakamura Tomoji and Sugie Ryuichi and Hashimoto Hideki and Uedono Akira and Ohba Takayuki}, title = {Impact of back-grinding-induced damage on Si wafer thinning for three-dimensional integration}, journal = {Jpn. J. Appl. Phys.}, year = 2014, } @article{CTT100741616, author = {Noriyuki Taoka and Osamu Nakatsuka and Yoriko Mizushima and Hideki Kitada and Young Suk Kim and Tomoji Nakamura and Takayuki Ohba and Shigeaki Zaima}, title = {Observation of lattice spacing fluctuation and strain undulation around through-Si vias in wafer-on-wafer structures using X-ray microbeam diffraction}, journal = {Japanese Journal of Applied Physics}, year = 2014, } @article{CTT100741620, author = {Akira Uedono and Yoriko Mizushima and Youngsuk Kim and Tomoji Nakamura and Takayuki Ohba and Nakaaki Yoshihara and Nagayasu Oshima and Ryoichi Suzuki}, title = {Vacancy-type defects induced by grinding of Si wafers studied by monoenergetic}, journal = {Journal of Applied Physics}, year = 2014, } @inproceedings{CTT100738468, author = {Aki Dote and Hideki Kitada and Yoriko Mizushima and Tomoji Nakamura and Seiki Sakuyama}, title = {Characterization of Warpages and Layout-Dependent Local-Deformations for Large Die 3D Stacking}, booktitle = {Electronic Components and Technology Conference (ECTC), 2016 IEEE 66th}, year = 2016, } @inproceedings{CTT100738574, author = {Y. S. Kim and S. Kodama and Y. Mizushima and T. Nakamura and N. Maeda and K. Fujimoto and A. Kawai and T. Ohba}, title = {Warpage-free Ultra-Thinning ranged from 2 to 5-μm for DRAM Wafers and Evaluation of Devices Characteristics}, booktitle = {Electronic Components and Technology Conference (ECTC), 2016 IEEE 66th}, year = 2016, }