@article{CTT100821134,
  author = {Yoshiyuki Seki and Yutaka Sawada and Hiroshi Funakubo and Kazuhisa Kawano and Noriaki Oshima},
  title = {Preparation of iridium metal films by spray chemical vapor deposition},
  journal = {MRS Advances},
  year = 2020,
}

@article{CTT100769658,
  author = {Hirokazu Chiba and Masaki Hirano and Kazuhisa Kawano and Noriaki Oshima and Hiroshi Funakubo},
  title = {Effect of substrate type and temperature on the growth of thin Ru films by metal organic chemical vapor deposition},
  journal = {Materials Science in Semiconductor Processing},
  year = 2017,
}

@article{CTT100744140,
  author = {Hirokazu CHIBA and Masaki HIRANO and Kazuhisa KAWANO and Noriaki OSHIMA and Hiroshi FUNAKUBO},
  title = {Effects of substrate surface composition and deposition temperature on deposition of flat and continuous Ru thin films},
  journal = {Journal of the Ceramic Society of Japan},
  year = 2016,
}

@article{CTT100702776,
  author = {Hiroshi Funakubo and Takahisa Shiraishi and Takahiro Oikawa and Masaki Hirano and Hirokazu Chiba and and Kazuhisa Kawano},
  title = {Effect of Incubation Time on Preparation of Continuous and Flat Ru Films},
  journal = {J. Vac. Sci. Technol. A.},
  year = 2015,
}

@article{CTT100599964,
  author = {Masaki Hirano and Kazuhisa Kawano and Hiroshi Funakubo},
  title = {Effect of incubation time on deposition behavior of Ruthenium films by MOCVD using (2,4-Dimethy lpentadienyl) (ethylcyclopentadienyl) Ruthenium},
  journal = {Key Engineering Materials},
  year = 2010,
}

@article{CTT100592698,
  author = {Kazuhisa Kawano and Hiroaki Kosuge and Noriaki Oshima and Tadashi Arii and Yutaka Sawada and Hiroshi Funakubo},
  title = {Ligand Structure Effect on A Divalent Ruthenium Precursor for MOCVD},
  journal = {Mater. Res. Soc. Symp. Proc.},
  year = 2009,
}

@article{CTT100592681,
  author = {Kazuhisa Kawano and Hiroaki Kosuge and Noriaki Oshima and Hiroshi Funakubo},
  title = {The Effect of Precursor Ligands on the Deposition Characteristics of Ru Films by MOCVD},
  journal = {Electrochem. Solid-State Lett.},
  year = 2009,
}

@article{CTT100552707,
  author = {Kazuhisa Kawano and Hiroaki Kosuge and Noriaki Oshima and Hiroshi Funakubo},
  title = {“Low-Temperature Preparation of Metallic Ruthenium Films by MOCVD Using Bis(2,4-dimethylpentadienyl)ruthenium”},
  journal = {Electrochem. Solid-State Lett.},
  year = 2007,
}

@inproceedings{CTT100821773,
  author = {Kazuhisa Kawano and Yoshiyuki Seki and Yutaka Sawada and Hiroshi Funakubo and Noriaki Oshima},
  title = {Good Step Coverage of Iridium Metal Films by Spray CVD},
  booktitle = {},
  year = 2019,
}