@article{CTT100639799,
  author = {Anri Nakajima and Shin-Ichiro Kuroki and Shuntaro Fujii and Takashi Ito},
  title = {In-Plane Grain Orientation Alignment of Polycrystalline Silicon Films},
  journal = {Jpn. J. Appl. Phys.},
  year = 2012,
}

@article{CTT100631771,
  author = {S.-I.Kuroki and S. Fujii and K. Kotani and T. Ito},
  title = {Carrier Transport and its variation of lase-lateral-crystallised poly-Si TFTs},
  journal = {ELECTRONICS LETTERS},
  year = 2011,
}

@article{CTT100625359,
  author = {Shin-Ichiro Kuroki and Yuya Kawasaki and Shuntaro Fujii and Koji Kotani and Takashi Ito},
  title = {Seed-Free Fabrication of Highly Bi-Axially Oriented Poly-Si Thin Films by Continuous-Wave Laser Crystallization with Double-Line Beams},
  journal = {J. Electrochem. Soc.},
  year = 2011,
}

@article{CTT100620746,
  author = {Shuntaro Fujii and Shin-Ichiro Kuroki and Koji Kotani and Takashi Ito},
  title = {Strain-Induced Back Channel Electron Mobility Enhancement in Polycrystalline Silicon Thin-Film Transistors Fabricated by Continuous-Wave Laser Lateral Crystallization},
  journal = {Japanese Journal of Applied Physics},
  year = 2011,
}

@article{CTT100620747,
  author = {Koji Kotani and Atsuo Sugimoto and Yutaka Omiya and Takashi Ito},
  title = {Above-Complementary Metal–Oxide–Semiconductor Metal Pattern Technique for Postfabrication Tuning of On-Chip Inductor Characteristics},
  journal = {Japanese Journal of Applied Physics},
  year = 2011,
}

@article{CTT100619123,
  author = {Anri Nakajima and Takashi Kudo and Takashi Ito},
  title = {Functional gate metal-oxide-semiconductor field-effect transistors using tunnel injection/ejection of trap charges enabling self-adjustable threshold voltage for ultralow power operation},
  journal = {Appl. Phys. Lett.},
  year = 2011,
}

@article{CTT100615408,
  author = {Shuntaro Fujii and Shin-Ichiro Kuroki and Masayuki Numata and Koji Kotani and Takashi Ito},
  title = {Roughness Reduction in Polycrystalline Silicon Thin Films Formed by Continuous-Wave Laser Lateral Crystallization with Cap SiO2 Thin Films},
  journal = {Jpn. J. Appl. Phys.},
  year = 2010,
}

@article{CTT100614583,
  author = {Takashi ITO and Xiaoli ZHU and Shin-Ichiro KUROKI and Koji KOTANI},
  title = {Highly Reliable and Drivability-Enhanced MOS Transistors with Rounded Nanograting Channels},
  journal = {IEICE TRANCE. ELECTRON.},
  year = 2010,
}

@article{CTT100613420,
  author = {Shin-Ichiro Kuroki and Xiaoli Zhu and Koji Kotani and Takashi Ito},
  title = {Enhancement of Current Drivability of Nanograting Polycrystalline Silicon Thin-Film Transistors},
  journal = {Japanese Journal of Applied Physics (JJAP)},
  year = 2010,
}

@article{CTT100613301,
  author = {Yutaka Omiya and Koji Kotani and Takashi Ito},
  title = {Above-Complementary Metal?Oxide?Semiconductor Inductor for Rapid Prototyping of Mixed-Signal System on Chips},
  journal = {The Japanese Journal of Applied Physics (JJAP)},
  year = 2010,
}

@article{CTT100613418,
  author = {Jun Jiang and Shin-Ichiro Kuroki and Koji Kotani and Takashi Ito},
  title = {Ferroelectric Properties of Lead Zirconate Titanate Thin Film on Glass Substrate Crystallized by Continuous-Wave Green Laser Annealing},
  journal = {Japanese Journal of Applied Physics (JJAP)},
  year = 2010,
}

@article{CTT100613299,
  author = {Koji Kotani and Yohei Koshimoto and Takashi Ito},
  title = {Stable Readout Circuit for Ferroelectric Random Access Memory Using Complementary Metal?Oxide?Semiconductor-Inverter-Based Capacitive-Feedback Charge-Integration Scheme},
  journal = {Japanease Journal of Applied Phisics (JJAP)},
  year = 2010,
}

@article{CTT100615419,
  author = {Koji Kotani and Atsushi Sasaki and Takashi Ito},
  title = {High-Efficiency Differential-Drive CMOS Rectifier},
  journal = {IEEE Journal of Solid-State Circuits},
  year = 2009,
}

@article{CTT100615416,
  author = {Rinji Sugino and Takashi Ito},
  title = {The formation, imaging, and application of thin silicon-dioxide membrane},
  journal = {Electrochimica Acta},
  year = 2009,
}

@article{CTT100615405,
  author = {Xun Gu and Takenao Nemoto and Akinobu Teramoto and Takashi Ito and Tadahiro Ohmi},
  title = {Effect of Additives in Organic Acid Solutions for Post-CMP Cleaning on Polymer Low-k Fluorocarbon},
  journal = {J. Electrochem. Soc.},
  year = 2009,
}

@article{CTT100615407,
  author = {Shin-Ichiro Kuroki and Kiichiro Tago and Koji Kotani and Takashi Ito},
  title = {Low-Temperature Recrystallization of Ferroelectric Lead Zirconate Titanate Thin Films on Glass Substrate Using Continuous-Wave Green Laser},
  journal = {Jpn. J. Appl. Phys.},
  year = 2009,
}

@article{CTT100615409,
  author = {Katsumasa Suzuki and Yoshio Ishihara and Kaoru Sakoda and Yasuyuki Shirai and Akinobu Teramoto and Masaki Hirayama and Tadahiro Ohmi and Takayuki Watanabe and Takashi Ito},
  title = {Inductively coupled plasma generator for an environmentally benign perfluorocarbon abatement system},
  journal = {J. Vac. Sci. Technol. A},
  year = 2009,
}

@article{CTT100615399,
  author = {Koji KOTANI and Takashi ITO},
  title = {Self-Vth-Cancellation High-Efficiency CMOS Rectifier Circuit for UHF RFIDs},
  journal = {IEICE TRANS. ELECTRON.},
  year = 2009,
}

@article{CTT100615370,
  author = {Katsumasa Suzuki and Yoshio Ishihara and Kaoru Sakoda and Yasuyuki Shirai and Akinobu  Teramoto and Masaki Hirayama and Tadahiro Ohmi and Takayuki Watanabe and Takashi Ito},
  title = {High-Efficiency PFC Abatement System Utilizing High-Efficiency PFC Abatement System Utilizing Immobilization},
  journal = {IEEE Trans. on Semicon. Manufacturing},
  year = 2008,
}

@article{CTT100615364,
  author = {Shuntaro Fujii and Shin-Ichiro Kuroki and Xiaoli Zhu and Masayuki Numata and Koji Kotani and Takashi Ito},
  title = {Crystallinity and Internal Strain of One-Dimensionally Long Si Grains by CW Laser Lateral Crystallization},
  journal = {ECS Transactions, 16 (9) (2008) 10.1149/1.2980543 © The Electrochemical Society},
  year = 2008,
}

@article{CTT100615363,
  author = {杉野林志 and Unsoon Kim and Kyunghoon Min and Ning Chen and Huaqiang Wu and Chungho Lee and Fred Cheung and Hiroyuki Kinoshita and 上西雅彦 and 加藤寿 and 多田新吾 and 伊藤隆司},
  title = {塩素ガスエッチングを用いた微細MOS Elevated Source/Drain プロセス},
  journal = {電子情報通信学会論文誌C},
  year = 2008,
}

@article{CTT100615344,
  author = {Tadahiro Ohmi and Hiraku ISHIKAWA and Toshihisa NOZAWA and Takaaki MATSUOKA and Akinobu TERAMOTO and Masaki HIRAYAMA and Takashi ITO and Tadahiro OHMI},
  title = {Evaluation of New Amorphous Hydrocarbon Film for Copper Barrier Dielectric Film in Low-k Copper Metallization},
  journal = {Japanese Journal of Applied Physics},
  year = 2008,
}

@article{CTT100615331,
  author = {Shuntaro FUJII and Shin-Ichiro KUROKI and Xiaoli ZHU and Masayuki NUMATA and Koji KOTANI and Takashi ITO},
  title = {Analysis of Continuous-Wave Laser Lateral Crystallized Polycrystalline},
  journal = {Jpn. J. Appl. Phys.},
  year = 2008,
}

@article{CTT100615332,
  author = {Xiaoli ZHU and Shin-Ichiro KUROKI and Koji KOTANI and Masatoshi FUKUDA and Hideharu SHIDO and Yasuyoshi MISHIMA and Takashi ITO},
  title = {Analysis of Drivability Enhancement Factors in Nanograting Metal–Oxide–Semiconductor Field-Effect Transistors},
  journal = {Japanese Journal of Applied Physics},
  year = 2008,
}

@article{CTT100615380,
  author = {Takenao Nemoto and Hiroshi Imai and Akinobu Teramoto and Takashi Ito and Shigetoshi Sugawa and Tadahiro Ohmi},
  title = {Tantalum Nitride Sputtering Deposition with Xe on Fluorocarbon for Cu Interconnections},
  journal = {Journal of The Electrochemical Society},
  year = 2008,
}

@article{CTT100615265,
  author = {Takashi Ito and Shin-Ichiro Kuroki and Kouji Kotani},
  title = {Nano-Grating Channel MOSFETs for Improved Current Drivability},
  journal = {ECS Transactions},
  year = 2007,
}

@article{CTT100615307,
  author = {Shin-Ichiro Kuroki and Shuntaro Fujii and Koji Kotani and Takashi Ito},
  title = {Self-seeding Crystallization of Silicon Thin Films Using Continuous-Wave Laser},
  journal = {ECS Transactions},
  year = 2007,
}

@article{CTT100615324,
  author = {Xiaoli ZHU and Shin-Ichiro KUROKI and Koji KOTANI and Hideharu SHIDO and Masatoshi FUKUDA and Yasuyoshi MISHIMA and Takashi ITO},
  title = {Characteristics of Nano-Grating N-Channel MOSFETs for Improved Current Drivability},
  journal = {IEICE Transactions on Electronics},
  year = 2007,
}

@article{CTT100615568,
  author = {K. Ishii and Y. Kikuchi and S. Matsuyama and Y. Kanai and K. Kotani and T. Ito and H. Yamazaki and Y. Funaki and R. Iwata and M. Itoh and K. Yanai and Jun Hatakezawa and N. Itoh and N. Tanizaki and D. Amano and M. Yamada and T. Yamaguchi},
  title = {First achievement of less than 1mm FWHM resolution in practical semiconductor animal PET scanner},
  journal = {Nuclear Instruments and Methods in Physics Research},
  year = 2007,
}

@article{CTT100615328,
  author = {Xiaoli Zhu and Shin-Ichiro Kuroki and Koji Kotani and Takashi Ito},
  title = {Advantages of Nano-grating Substrates in CMOS -FET Characteristics},
  journal = {ECS Transactions},
  year = 2007,
}

@article{CTT100615317,
  author = {Hisakazu Miyatake and Takashi Ito},
  title = {Improvement of ArF Photo Resist Pattern by VUV Cure},
  journal = {IEICE Transactions on Electronics},
  year = 2007,
}

@article{CTT100615318,
  author = {Shuntaro Fujii and Shin-Ichiro Kuroki and Koji Kotani and Takashi Ito},
  title = {Enlargement of Crystal Grains in Thin Silicon Films by Continuous-Wave Laser Irradiation},
  journal = {Jpn. J. Appl. Phys.},
  year = 2007,
}

@article{CTT100615327,
  author = {Shin-Ichiro Kuroki and Masayuki Toda and Masaru Umeda and Koji Kotani and Takashi Ito},
  title = {Permittivity Enhancement of Mechanically Strained SrTiO MIM Capacitor},
  journal = {ECS Transactions},
  year = 2007,
}

@article{CTT100615263,
  author = {伊藤隆司 and 杉野林志 and 石川健治},
  title = {ライ洗浄技術―半導体製造―},
  journal = {精密工学会誌},
  year = 2004,
}

@article{CTT100634588,
  author = {伊藤隆司 and 杉野林志 and 石川健治},
  title = {ドライ洗浄技術―半導体製造―},
  journal = {精密工学会誌},
  year = 2004,
}

@article{CTT100615257,
  author = {Kanetake Takasaki and Kiyoshi Irino and Takayuki Aoyama and Youichi Momiyama and Toshiro Nakanishi and Yasuyuki Tamura and Takashi Ito},
  title = {Impact of Nitrogen Profile in Gate Nitrided-Oxide on Deep-Submicron CMOS Performance and Reliability},
  journal = {Fujitsu Sci. and Tech. Jour.},
  year = 2003,
}

@article{CTT100615258,
  author = {Takashi Ito},
  title = {Research & Development of Advanced CMOS Technologies},
  journal = {Fujitsu Sci. and Tech. Jour.},
  year = 2003,
}

@article{CTT100634587,
  author = {Takashi Ito},
  title = {Research & Development of Advanced CMOS Technologies},
  journal = {FUJITSU SCIENTIFIC & TECHNICAL JOURNAL},
  year = 2003,
}

@article{CTT100634586,
  author = {Kanetake Takasaki and Kiyoshi Irino and Takayuki Aoyama and Youichi Momiyama and Toshiro Nakanishi and Yasuyuki Tamura and Takashi Ito},
  title = {Impact of Nitrogen Profile in Gate Nitrided-Oxide on Deep-Submicron CMOS Performance and Reliability},
  journal = {FUJITSU SCIENTIFIC & TECHNICAL JOURNAL},
  year = 2003,
}

@article{CTT100615243,
  author = {Takashi Ito and Shinji Okazaki},
  title = {Pushing the limits of lithography},
  journal = {Nature},
  year = 2000,
}

@article{CTT100634585,
  author = {Takashi Ito and Shinji Okazaki},
  title = {Pushing the Limit of Lithography},
  journal = {Nature},
  year = 2000,
}

@article{CTT100625361,
  author = {Takashi Ito and Rinji Sugino},
  title = {Dry Cleaning Technologies Using UV-Excited   Radicals and Cryogenic Aerosols},
  journal = {Solid State Phenomena},
  year = 1999,
}

@article{CTT100625370,
  author = {Rinji Sugino and Takashi Ito},
  title = {Removal of Fe Contaminants in SiO2 Layers with Successive Processing of Poly-Si Deposition and Cl-Radical Etching},
  journal = {J. Electrochem. Soc.},
  year = 1997,
}

@article{CTT100625369,
  author = {Rinji Sugino and Yoshiko Okui and Mayumi Shigeno and Satoshi Okuno and Kanetake Takasaki and Takashi Ito},
  title = {Dry Cleaning for Fe Contaminants on Si and SiO2   Surfaces with Silicon Chlorides},
  journal = {J. Electrochem. Soc.},
  year = 1997,
}

@article{CTT100634584,
  author = {Rinji Sugino and Toshiro Nakanishi and Kanetake Takasaki and Takashi Ito},
  title = {Identification of MOS Gate Dielectric Breakdown Spot Using High Selectivity Cl Radical Etching Technique},
  journal = {Journal of The Electrochemical Society},
  year = 1996,
}

@article{CTT100634583,
  author = {Takashi Ito},
  title = {Sequential Dry Cleaning System for Highly-Controlled Silicon Surfaces},
  journal = {IEICE TRANSACTIONS on Electronics},
  year = 1996,
}

@article{CTT100634582,
  author = {Fumitoshi Sugimoto and Yoshihiro Arimoto and Takashi Ito},
  title = {Simultaneous Temperature Measurement of Wafers in Chemical Mechanical Polishing of Silicon Dioxide Layer},
  journal = {Japanese Journal of Applied Physics},
  year = 1995,
}

@article{CTT100634581,
  author = {Yoji Saito and Hideo Imai and Yoshihiro Sugita and Takashi Ito},
  title = {Effects of Vacuum-Ultraviolet-Light-Induced Surface Reaction on Selective and Anisotropic Etching of Silicon Dioxide Using Anhydrous Hydrogen Fluoride Gas},
  journal = {Japanese Journal of Applied Physics},
  year = 1995,
}

@article{CTT100634580,
  author = {Fumitoshi Sugimoto and Hiroshi Horie and Yoshihiro Arimoto and Takashi Ito},
  title = {A pH-Controlled Chemical Mechanical Polishing Method for Thin Bonded Silicon-on-Insulator Wafers},
  journal = {Japanese Journal of Applied Physics},
  year = 1995,
}

@article{CTT100634579,
  author = {Takayuki Aoyama and Kunihiro Suzuki and Hiroko Tashiro and Yoko Toda and Tatsuya Yamazaki and Kanetake Takasaki and Takashi Ito},
  title = {Effect of Fluorine on Boron Diffusion in Thin Silicon Dioxides and Oxynitride},
  journal = {Journal of Applied Physics},
  year = 1994,
}

@article{CTT100634578,
  author = {Kenichi Goto and Tatsuya Yamazaki and Yasuo Nara and Tetsu Fukano and Toshihiro Sugii and Yoshihiro Arimoto and Takashi Ito},
  title = {Ti Salicide Process for Sub-quarter-Micron CMOS Devices},
  journal = {IEICE TRANSACTIONS on Electronics},
  year = 1994,
}

@article{CTT100634577,
  author = {Rinshi Sugino and Yasuo Nara and Hiroshi Horie and Takashi Ito},
  title = {Ultraviolet Excited Cl-Radical Etching of Si Through Native Oxides},
  journal = {Journal of Applied Physics},
  year = 1994,
}

@article{CTT100634576,
  author = {Kunihiro Suzuki and Tetsu Tanaka and Yoshiharu Tosaka and Hiroshi Horie and Yoshihiro Arimoto and Takashi Ito},
  title = {Analytical Surface Potential Expression for Thin Film Double-Gate SOI MOSFETs},
  journal = {Solid-State Electron},
  year = 1994,
}

@article{CTT100634574,
  author = {Takayuki Aoyama and Kunihiro Suzuki and Hiroko Tashiro and Tatsuya Yamazaki and Yoshihiro Arimoto and Takashi Ito},
  title = {Boron Diffusion Through Pure Silicon Oxide and Oxynitride for Metal-Oxide-Semiconductor Devices},
  journal = {Journal of The Electrochemical Society},
  year = 1993,
}

@article{CTT100634572,
  author = {Satoru Watanabe and Kei Horiuchi and Takashi Ito},
  title = {Atomic Step Structure on Vicinal H/Si (111) Surface Formed by Hot Water Immersion},
  journal = {Japanese Journal of Applied Physics},
  year = 1993,
}

@article{CTT100634571,
  author = {Takayuki Aoyama and Tatsuya Yamazaki and Takashi Ito},
  title = {Silicon Surface Cleaning Using Photoexcited Fluorine Gas Diluted with Hydrogen},
  journal = {Journal of The Electrochemical Society},
  year = 1993,
}

@article{CTT100634573,
  author = {Manabu Kojima and Atsushi Fukuroda and Tetsu Fukano and Naoshi Higaki and Tatsuya Yamazaki and Toshihiro Sugii and Yoshihiro Arimoto and Takashi Ito},
  title = {High-Speed SOI Bipolar Transistors Using Bonding and Thinning Techniques},
  journal = {IEICE TRANSACTIONS on Electronics},
  year = 1993,
}

@article{CTT100634570,
  author = {Yoshihiro Arimoto and Hiroshi Horie and Naoshi Higaki and Manabu Kojima and Fumitoshi Sugimoto and Takashi Ito},
  title = {Advanced Metal Oxide Semiconductor and Bipolar Devices on Bonded Silicon-on-Insulators},
  journal = {Journal of The Electrochemical Society},
  year = 1993,
}

@article{CTT100634569,
  author = {Takayuki Aoyama and Tatsuya Yamazaki and Takashi Ito},
  title = {Surface Cleaning for Si Epitaxy Using Photoexcited Fluorine Gas},
  journal = {Journal of The Electrochemical Society},
  year = 1993,
}

@article{CTT100634568,
  author = {Yasuhisa Sato and Rinshi Sugino and Masaki Okuno and Toshiro Nakanishi and Takashi Ito},
  title = {Electrical Characteristics of Silicon Devices after UV-Excited Cleaning},
  journal = {IEICE Transaction on Electronics},
  year = 1993,
}

@article{CTT100634575,
  author = {Yasuo Nara and Yoshihiro Sugita and Kei Horiuchi and Takashi Ito},
  title = {Fine Pattern Etching of Silicon Using SR-Assisted lonization of CP4 Gas},
  journal = {Journal of Photopolymer Science and Technology},
  year = 1993,
}

@article{CTT100634565,
  author = {Yasuo Nara and Fabrice Moscheni and Yoshio Sugita and Kei Horiuchi and Takashi Ito},
  title = {Evaluation of Photoemitted Current from SiO2 Film on Silicon During Synchrotron Radiation lrradiation},
  journal = {Japanese Journal of Applied Physics},
  year = 1992,
}

@article{CTT100634567,
  author = {Norio Miyata and Tatsuya Yamazaki and Yoshihiro Arimoto and Takashi Ito},
  title = {Intermittent Ultraviolet lrradiation for Silicon Selective Epitaxial Growth},
  journal = {Applied Phisics Letters},
  year = 1992,
}

@article{CTT100634559,
  author = {Yasuo Nara and Yoshihiro Sugita and Kei Horiuchi and Takashi Ito},
  title = {Synchrotron Radiation-Assisted Silicon Homoepitaxy at 100 ℃ Using Si2H6/H2 Mixture},
  journal = {Applied Phisics Letters},
  year = 1992,
}

@article{CTT100634558,
  author = {Takayuki Aoyama and Tatsuya Yamazaki and Takashi Ito},
  title = {Nonuniformities of Native Oxide on Si(001) Surfaces Formed during Wet Chemical Cleaning},
  journal = {Applied Phisics Letters},
  year = 1992,
}

@article{CTT100634564,
  author = {Rinshi Sugino and Yoshiko Okui and Masaki Okuno and Mayumi Shigeno and Yasuhisa Sato and Akira Osawa and Takashi Ito},
  title = {Removal of Fe and Al on a Silicon Surface Using UV-Excited Dry Cleaning},
  journal = {IEICE TRANSACTIONS on Electronics},
  year = 1992,
}

@article{CTT100634563,
  author = {Yasuo Nara and Yoshihiro Sugita and Kei Horiuchi and Takashi Ito},
  title = {Synchrotron Radiation-Assisted Silicon Film Growth by lrradiation Parallel to the Substrate},
  journal = {Japanese Journal of Applied Physics},
  year = 1992,
}

@article{CTT100634560,
  author = {Yasuo Nara and Yoshihiro Sugita and Noriaki Nakayama and Takashi Ito},
  title = {Etching of Si02 Film by Synchrotron Radiation in Hydrogen and its Application to Low Temperature Surface Cleaning},
  journal = {Journal of Vaccum Science and Technology},
  year = 1992,
}

@article{CTT100634562,
  author = {Hiroki Ogawa and Naozumi Terada and Kazuhisa Sugiyama and Kazunori Moriki and Noriyuki Miyata and Takayuki Aoyama and Rinshi Sugino and Takashi Ito and Takeo Hattori},
  title = {Silicon-Hydrogen Bonds in Silicon Oxide Near the SiO2/Si Interface},
  journal = {Applied Surface Science},
  year = 1992,
}

@article{CTT100634566,
  author = {Toshihiro Sugii and Tatsuya Yamazaki and Yoshihiro Arimoto and Takashi Ito and Yuji Furumura and Ikuo.Namura and Hiroshi Goto and Toshiya Tahara},
  title = {SiC Growth and its Application  to High Speed Si-HBTs},
  journal = {Microelectronic Engineering},
  year = 1992,
}

@article{CTT100634556,
  author = {Yasuhiro Sato and Rinshi Sugino and Takashi Ito},
  title = {Photoexcited Processes for Semiconductor Dry Cleaning and Dry Etching},
  journal = {FUJITSU SCIENTIFIC & TECHNICAL JOURNAL},
  year = 1991,
}

@article{CTT100634554,
  author = {Satoru Watanabe and Mayumi Shigeno and Noriaki Nakayama and Takashi Ito},
  title = {Silicon Monohydride Termination of Silicon (111) Surface Formed by Boiling Water},
  journal = {Japanese Journal of Applied Physics},
  year = 1991,
}

@article{CTT100634557,
  author = {Tatsuya Yamazaki and Takashi Ito},
  title = {Photoexcited Processes for Semiconductor Low Temperature Epitaxy},
  journal = {FUJITSU SCIENTIFIC & TECHNICAL JOURNAL},
  year = 1991,
}

@article{CTT100634550,
  author = {Satoru Watanabe and Noriaki Nakayama and Takashi Ito},
  title = {Homogeneous Hydrogen-Terminated Si(111) Surface Formed Using Aqueous HF Solution and Water},
  journal = {Applied Phisics Letters},
  year = 1991,
}

@article{CTT100634548,
  author = {Takayuki Aoyama and Tatsuya Yamazaki and Takashi Ito},
  title = {Removing Native Oxide from Si (001) Surfaces using Photoexcited Fluorine Gas},
  journal = {Applied Phisics Letters},
  year = 1991,
}

@article{CTT100634551,
  author = {Atsushi Fukuroda and Toshihiro Sugii and Yoshihiro Arimoto and Takashi Ito},
  title = {Si Wafer Bonding with Ta Silicide Formation},
  journal = {Japanese Journal of Applied Physics},
  year = 1991,
}

@article{CTT100634553,
  author = {Yasuo Nara and Yoshihiro Sugita and Noriaki Nakayama and Takashi Ito},
  title = {Synchrotron Radiation Assisted Removal of Oxygen and Carbon Contaminants from a Silicon Surface},
  journal = {Japanese Journal of Applied Physics},
  year = 1991,
}

@article{CTT100634549,
  author = {Toshihiro Sugii and Tatsuya Yamazaki and Takashi Ito},
  title = {Achieving High Current Gain and Low Emitter Resistance with the SiCx:F Widegap Emitter},
  journal = {Japanese Journal of Applied Physics},
  year = 1991,
}

@article{CTT100634555,
  author = {渡辺悟 and 滋野真弓 and 伊藤隆司},
  title = {プロセスを高性能化する水素ターミネートSi表面},
  journal = {ウルトラクリーンテクノロジー},
  year = 1991,
}

@article{CTT100634552,
  author = {伊藤隆司 and 山崎辰也},
  title = {光励起プロセスを用いたSiの低温エピタキシー},
  journal = {精密工学会誌},
  year = 1991,
}

@article{CTT100634543,
  author = {Kazuhisa Sugiyama and Takayuki lgarashi and Kazunori Moriki and Yoshikatsu Nagasawa and Takayuki Aoyama and Rinshi Sugino and Takashi Ito and Takeo Hattori},
  title = {Silicon-Hydrogen Bonds in Native Oxides Formed During Wet Chemical   Treatments},
  journal = {Japanese Journal of Applied Physics},
  year = 1990,
}

@article{CTT100634546,
  author = {Toshihiro Sugii and Tatsuya Yamazaki and Takashi Ito},
  title = {Si Hetero-Bipolar Transistor with a Fluorine Doped SiC Emitter and a Thin, Highly-Doped Epitaxial Base},
  journal = {IEEE Transactions on Electron Devices},
  year = 1990,
}

@article{CTT100634545,
  author = {Tatsuya Yamazaki and Hiroshi Minakata and Takashi Ito},
  title = {Continuous Growth of Low-Temperature Si Epitaxial Layer with Heavily Phosphorous and Boron Doping Using Photoepitaxy},
  journal = {Journal of The Electrochemical Society},
  year = 1990,
}

@article{CTT100634561,
  author = {Tatsuya Yamazaki and Norio Miyata and Takayuki Aoyama and Takashi Ito},
  title = {Investigation of Thermal Removal of Native Oxide from Si (100) Surfaces in Hydrogen for Low-Temperature Si CVD Epitaxy},
  journal = {Journal of The Electrochemical Society},
  year = 1990,
}

@article{CTT100634547,
  author = {Toshihiro Sugii and Takayuki Aoyama and Takashi Ito},
  title = {Low-Temperature Growth of SiC on Si by Gas-Source MBE},
  journal = {Journal of The Electrochemical Society},
  year = 1990,
}

@article{CTT100634544,
  author = {Tatsuya Yamazaki and Satoru Watanabe and Takashi Ito},
  title = {Heavy Boron Doping in Low Temperature Si Photoepitaxy},
  journal = {Journal of The Electrochemical Society},
  year = 1990,
}

@article{CTT100634540,
  author = {Takayuki Aoyama and Toshihiro Sugii and Takashi Ito},
  title = {Determination of Band Line-up in βSiC/Si Heterojunction for Si-HBTs},
  journal = {Applied Surface Science},
  year = 1989,
}

@article{CTT100634542,
  author = {Toshihiro Sugii and Takayuki Aoyama and Takashi Ito},
  title = {Polycrystalline SiC for A Wide-Gap Emitter of Si-HBTs},
  journal = {Journal of The Electrochemical Society},
  year = 1989,
}

@article{CTT100634541,
  author = {Satoru Watanabe and Rinshi Sugino and Tatsuya Yamazaki and Yasuo Nara and Takashi Ito},
  title = {Wafer Cleaning with Photoexcited Chlorine and Thermal Treatment for High-Quality Silicon Epitaxy},
  journal = {Japanese Journal of Applied Physics},
  year = 1989,
}

@article{CTT100634538,
  author = {Tatsuya Yamazaki and Hiroshi Minakata and Takashi Ito},
  title = {Continuous Growth of Heavily Doped p+-n+ Si Epitaxial Layer Using Low-Temperature Photoepitaxy},
  journal = {Applied Physics Letters},
  year = 1989,
}

@article{CTT100634537,
  author = {Toshihiro Sugii and Tatsuya Yamazaki and Takashi Ito},
  title = {Improved Current Gain in Bipolar Transistor with Bandgap Narrowing in Base},
  journal = {Electronics Letters},
  year = 1989,
}

@article{CTT100634539,
  author = {Takeo Hattori and Kazuhiro Takase and Hiroaki Yamagishi and Rinshi Sugino and Yasuo Nara and Takashi Ito},
  title = {Chemical Structures of Native Oxides Formed during Wet Chemical Treatment},
  journal = {Japanese journal of applied physics},
  year = 1989,
}

@article{CTT100634533,
  author = {Takashi Kato and Takashi Ito},
  title = {Interfacial Oxidation of Silicon Substrates through Ta2O5},
  journal = {Journal of The Electrochemical Society},
  year = 1988,
}

@article{CTT100634534,
  author = {杉野林志 and 奈良安雄 and 渡辺悟 and 伊藤隆司},
  title = {光励起塩素ラジカルを用いたシリコンのエッチングとクリーニング},
  journal = {電気化学および工業物理化学},
  year = 1988,
}

@article{CTT100634532,
  author = {Takashi Kato and Takashi Ito and Mamoru Maeda},
  title = {Chemical Vapor Deposition of Aluminum Enhanced by Magnetron-Plasma},
  journal = {Journal of The Electrochemical Society},
  year = 1988,
}

@article{CTT100634536,
  author = {Toshihiro Sugii and Takashi Ito and Yuji Furumura and Toru Doki and Fumio Mieno and Mamoru Maeda},
  title = {β-SiC/Si Hetero Junction Bipolar Transistors with High Current Gain},
  journal = {IEEE Electron Device Letters},
  year = 1988,
}

@article{CTT100634535,
  author = {Toshihiro Sugii and Takashi Ito and Hajime Ishikawa},
  title = {Low-Temperature Fabrication of Silicon Nitride Films by ArF Excimer Laser lrradiation},
  journal = {Japanese Journal of Applied Physics},
  year = 1988,
}

@article{CTT100634530,
  author = {Toshihiro Sugii and Tatsuya Yamazaki and Tetsu Fukano and Takashi Ito},
  title = {Epitaxially Grown Base Transistor for High-Speed Operation},
  journal = {Electron Device Letters, IEEE},
  year = 1987,
}

@article{CTT100634531,
  author = {Toshihiro Sugii and Takashi Ito and Yuji Furumura and Makoto Doki and Fumio Mieno and Mamoru Maeda},
  title = {Si Heterojunction Bipolar Transistors with Single-Crystalline β-SiC Emitters},
  journal = {Journal of The Electrochemical Society},
  year = 1987,
}

@article{CTT100634526,
  author = {Takashi Ito},
  title = {Negative Drain Conductance in a Short-Channel Silicon MISFET},
  journal = {FUJITSU SCIENTIFIC & TECHNICAL JOURNAL},
  year = 1986,
}

@article{CTT100634529,
  author = {伊藤隆司},
  title = {プラズマCVDと光CVD},
  journal = {電気化学および工業物理化学},
  year = 1986,
}

@article{CTT100634527,
  author = {伊藤隆司},
  title = {シリコンの酸化および窒化プロセスと特性制御},
  journal = {表面},
  year = 1986,
}

@article{CTT100634528,
  author = {Takashi Ito and Hiroshi Horie and Tetsu Fukano and Hajime Ishikawa},
  title = {A Nitride-Isolated Molybdenum-Polysilicon Gate Electrode for MOS VLSI Circuits},
  journal = {IEE Trans Electron Devices},
  year = 1986,
}

@article{CTT100634524,
  author = {Shinpei Hijiya and Takashi Ito and Tetsuo Nakamura},
  title = {A High-Speed Write/Erase EAROM Cell},
  journal = {FUJITSU SCIENTIFIC & TECHNICAL JOURNAL},
  year = 1984,
}

@article{CTT100634520,
  author = {Toshihiro Sugii and Takashi Ito and Hajime Ishikawa},
  title = {Excimer Laser Enhanced  Nitridation of Silicon Substrates},
  journal = {Applied Phisics Letters},
  year = 1984,
}

@article{CTT100634522,
  author = {Ichiro Kato and Takashi Ito and Tetsuo Nakamura and Hajime Ishikawa},
  title = {Characteristics of Thermally Nitrided Silicon Dioxide Film and Plasma Enhancement},
  journal = {Journal of Electronic Materials},
  year = 1984,
}

@article{CTT100634525,
  author = {土屋真平 and 伊藤隆司 and 中村哲夫},
  title = {傾斜したバンドギャップを持つ高速EAROMセル},
  journal = {電子通信学会論文誌},
  year = 1984,
}

@article{CTT100634523,
  author = {伊藤隆司},
  title = {Siの熱窒化による薄膜生成とその界面},
  journal = {材料科学},
  year = 1984,
}

@article{CTT100634521,
  author = {伊藤隆司},
  title = {メタルCVD},
  journal = {材料技術},
  year = 1984,
}

@article{CTT100634519,
  author = {Takashi Ito and Tetsuo Nakamura and Hajime Ishikawa},
  title = {Advantages of Thermal Nitride and Nirtoxide Gate Films in VLSI Process},
  journal = {IEEE Transactions on Electron Devices},
  year = 1982,
}

@article{CTT100634518,
  author = {Takashi Ito and Tetsuo Nakamura and Hajime Ishikawa},
  title = {Effect of Thermally Nitrided SiO2 (Nirtoxide) on MOS Charactristics},
  journal = {Journal of The Electrochemical Society},
  year = 1982,
}

@article{CTT100634517,
  author = {Shinpei Hijiya and Takashi Ito and Tetsuo Nakamura and Hajime Ishikawa and Hideki Arakawa},
  title = {A Nitride Barrier Avalanche Injection EAROM},
  journal = {IEEE Journal of Solid-State Circuits},
  year = 1982,
}

@article{CTT100634516,
  author = {Takashi Ito},
  title = {Thermal Silicon Nitride Films-Growth and Application to LSI Devices},
  journal = {Semiconductor Technology},
  year = 1982,
}

@article{CTT100634515,
  author = {Ichiro Kato and Takashi Ito and Shnichi Inoue and Tetsuo Nakamura and Hajime Ishikawa},
  title = {Ammonia Annealed SiO2 Films for Thin Gate Insulators},
  journal = {Japanese Journal of Applied Physics. Supplement},
  year = 1982,
}

@article{CTT100634514,
  author = {Takashi Ito and Ichiro Kato and Takao Nozak and Tetsuo Nakamura and Hajime Ishikawa},
  title = {Plasma enhanced Thermal Nitridation of Silicon},
  journal = {Applied Phisics Letters},
  year = 1981,
}

@article{CTT100634510,
  author = {Shinpei Hijiya and Takashi Ito and Masaichi Shinoda},
  title = {Dual Dielectric Nonvolatile Memory Cells with Thermally Grown Silicon Nitride Films},
  journal = {Fujitsu Scientific and Technical Journal.},
  year = 1980,
}

@article{CTT100634513,
  author = {伊藤隆司},
  title = {Siの直接熱窒化},
  journal = {応用物理},
  year = 1980,
}

@article{CTT100634512,
  author = {Takashi Ito and Hideki Arakawa and Takao Nozaki and Hajime Ishikawa},
  title = {Retardation of Destructive Breakdown of SiO2 Films Annealed in Ammonia Gas},
  journal = {Journal of The Electrochemical Society},
  year = 1980,
}

@article{CTT100634511,
  author = {Takashi Ito and Takao Nozaki and Hajime Ishikawa},
  title = {Direct Thermal Nitridation of Silicon Dioxide Films in Ammonia Gas},
  journal = {Journal of The Electrochemical Society},
  year = 1980,
}

@article{CTT100634509,
  author = {Takashi Ito and Hajime Ishikawa and Yukio Fukukawa},
  title = {Thermal Nitridation of Silicon in Advanced LSI Processing},
  journal = {Japanese Journal of Applied Physics. Supplement},
  year = 1980,
}

@article{CTT100634507,
  author = {Takashi Ito and Shinpei Hijiya and Takao Nozaki and Hideki Arakawa and Masaichi Shinoda and Yukio Fukukawa},
  title = {Very Thin Silicon Nitride Films Grown by Direct Thermal Reaction with Nitrogen},
  journal = {Journal of The Electrochemical Society},
  year = 1979,
}

@article{CTT100634508,
  author = {Takashi Ito and Shinpei Hijiya and Takao Nozaki and Hideki Arakawa and Masaichi Shinoda},
  title = {Low Voltage Alterable EAROM Cells with Nitride-Barrier Avalanche Injection MIS(NAMIS)},
  journal = {IEEE TRANSACTIONS ON ELECTRON DEVICES},
  year = 1979,
}

@article{CTT100634506,
  author = {Takashi Ito and Takao Nozaki and Hideki Arakawa and Masaichi Shinoda},
  title = {Thermally Grown Silicon Nitride Films for High Performance MNS Devices},
  journal = {Applied Phisics Letters},
  year = 1978,
}

@article{CTT100634505,
  author = {Takashi Ito and Shinpei Hijiya and Hidetoshi Nishi and Masaichi Shinoda and Toshio Furuya},
  title = {Interfacial Doping by Recoil Implantation for Nonvolatile Memories},
  journal = {Japanese Journal of Applied Physics. Supplement},
  year = 1978,
}

@article{CTT100634502,
  author = {伊藤隆司 and 酒井義雄},
  title = {GaAs-MIS-FET},
  journal = {応用物理},
  year = 1974,
}

@article{CTT100633375,
  author = {伊藤隆司 and 酒井義雄},
  title = {GaAs-MIS-FET},
  journal = {応用物理},
  year = 1974,
}

@article{CTT100634503,
  author = {Takashi Ito and Yoshio Sakai},
  title = {The GaAs Inversion-Type MIS Transistors},
  journal = {Solid-State Electronics},
  year = 1974,
}

@article{CTT100615113,
  author = {伊藤隆司 and 酒井 義雄},
  title = {GaAｓ-絶縁膜界面における変性層トラップ密度と充放電特性},
  journal = {電気学会論文誌},
  year = 1974,
}

@article{CTT100634504,
  author = {寺尾博 and 伊藤隆司 and 酒井義雄},
  title = {InAs-MIS構造の界面特性と電界効果トランジスタへの応用},
  journal = {電気学会論文誌},
  year = 1974,
}

@article{CTT100605087,
  author = {伊藤隆司 and 酒井義雄},
  title = {GaAs表面への絶縁層の生成と界面特性},
  journal = {電気学会論文誌},
  year = 1973,
}

@inproceedings{CTT100630109,
  author = {Shin-Ichiro Kuroki and Yuji Kawasaki and Koji Kotani and Takashi Ito and Katsuyoshi Washio},
  title = {Crystal Growth of Highly Biaxially-Oriented Poly-Si Thin Films by W-Line Beam Continuous-Wave Laser Lateral Crystallization},
  booktitle = {The proceedings of AM-FPD11},
  year = 2011,
}

@inproceedings{CTT100619125,
  author = {Shin-Ichiro Kuroki and Yuya Kawasaki and Shuntaro Fujii and Koji Kotani and Takashi Ito},
  title = {Bi-Axially Orientation-Controlled Si Thin Films on Glass Substrates by Double-Line-Beam CW Laser Annealing},
  booktitle = {Proc. of Ⅵ Workshop of the Thematic Network on  Silicon On Insulator Technology, Devices and Materials},
  year = 2011,
}

@inproceedings{CTT100615520,
  author = {Shin-Ichiro Kuroki and Xiaoli Zhu and Koji Kotani and Takashi Ito},
  title = {The Drivability Enhancement of Poly-Si TFTs by use of Nanograting Substrate},
  booktitle = {Extended Abstracts of the 2009 International Conference on Solid State Devices and Materials (SSDM2009)},
  year = 2010,
}

@inproceedings{CTT100615428,
  author = {S. Fujii and S. Kuroki and K. Kotani and T. Ito},
  title = {Enlargement of Crystal-Grains in Thin Silicon Films Using Continuous-Wave Laser Irradiation},
  booktitle = {Extended Abstracts of the 2010 International Conference on Solid State Devices and Materials},
  year = 2010,
}

@inproceedings{CTT100613430,
  author = {Shuntaro Fujii and Shin-Ichiro Kuroki and Koji Kotani and Takashi Ito},
  title = {Strain-Induced Back Channel Electron Mobility Enhancement in Poly-Si TFTs Formed by Continuous-Wave Laser Lateral Crystallization},
  booktitle = {2010 International Conference on Solid State Devices and Materials (SSDM2010)},
  year = 2010,
}

@inproceedings{CTT100613428,
  author = {Koji Kotani and Atsuo Sugimoto and Yutaka Omiya and Takashi Ito},
  title = {Above-CMOS Metal-Pattern Technique for Flexible Inductance Adjustment in Rapid Prototyping of RF SoCs},
  booktitle = {2010 International Conference on Solid State Devices and Materials (SSDM2010)},
  year = 2010,
}

@inproceedings{CTT100615437,
  author = {S.Kuroki and S.Fujii and K.Kotani and T.Ito},
  title = {Self-seeding Crystallization of Silicon Thin Films Using Continuous-Wave Laser},
  booktitle = {211th ECS Spring Meeting, ECS Transactions},
  year = 2010,
}

@inproceedings{CTT100613426,
  author = {Hiroaki Arai and Naoto Miyamoto and Koji Kotani and Hisanori Fujisawa and Takashi Ito},
  title = {A WiMAX Turbo Decoder with Tailbiting BIP Architecture},
  booktitle = {15th Asia and South Pacific Design Automation Conference ASP-DAC 2010},
  year = 2010,
}

@inproceedings{CTT100615523,
  author = {Hiroaki Arai and Naoto Miyamoto and Koji Kotani and Hisanori Fujisawa and Takashi Ito},
  title = {A WiMAX Turbo Decoder with Tailbiting BIP Architecture},
  booktitle = {IEEE Asian Solid-State Circuits Conference 2009 (A-SSCC 2009)},
  year = 2009,
}

@inproceedings{CTT100615519,
  author = {Ken Haruyama and Koji Kotani and Takashi Ito},
  title = {Highly-Accurate Ladder Model of Inductors on a Glass Substrate},
  booktitle = {Extended Abstracts of the 2009 International Conference on Solid State Devices and Materials (SSDM2009)},
  year = 2009,
}

@inproceedings{CTT100615522,
  author = {Takashi Ito and Masaki Midorikawa},
  title = {Continuous Manipulation of Micro Particles by Use of Asymmetric Electrodes Array},
  booktitle = {Extended Abstracts of the 2009 International Conference on Solid State Devices and Materials (SSDM2009)},
  year = 2009,
}

@inproceedings{CTT100615494,
  author = {Koji Kotani and Yohei Koshimoto and Takashi Ito},
  title = {Bitline-Capacitance-Insensitive Readout Circuit Using Capacitive-Feedback Charge-Integration Scheme for Low-Voltage FeRAM},
  booktitle = {Extended Abstracts of the 2009 International Conference on Solid State Devices and Materials (SSDM2009)},
  year = 2009,
}

@inproceedings{CTT100615513,
  author = {Jun Jiang and Shin-Ichiro Kuroki and Koji Kotani and Takashi Ito},
  title = {Highly-(001)-Oriented Ferroelectric PZT Thin Films on Glass by CW Green-Laser Crystallization},
  booktitle = {Extended Abstracts of the 2009 International Conference on Solid State Devices and Materials (SSDM2009)},
  year = 2009,
}

@inproceedings{CTT100615517,
  author = {Koji Hara and Yuichiro Tanushi and Shin-Ichiro Kuroki and Koji Kotani and Takashi Ito},
  title = {Ion-Implanted Boron Activation in a Preamorphized Si Layer by Microwave Annealing},
  booktitle = {Extended Abstracts of the 2009 International Conference on Solid  State Devices and Materials (SSDM2009)},
  year = 2009,
}

@inproceedings{CTT100615514,
  author = {Yutaka Omiya and Koji Kotani and Takashi Ito},
  title = {Above-CMOS Inductor for Rapid Prototyping of Mixed-Signal SOCs},
  booktitle = {Extended Abstracts of the 2009 International Conference on Solid State Devices and Materials (SSDM2009)},
  year = 2009,
}

@inproceedings{CTT100615529,
  author = {Koji Kotani and Takashi Ito},
  title = {High-Efficiency CMOS Rectifier Circuits for UHF RFIDs Using Self-Vth Cancellation Techniquues},
  booktitle = {2009 IEEE 8th International Conference on ASIC (ASICON 2009)},
  year = 2009,
}

@inproceedings{CTT100615477,
  author = {Sang-su Seong and K. Kotani and T. Ito},
  title = {Design of UHF RFID Antennas with  Integrated Matching Circuitry for Bio-engineering Applications},
  booktitle = {Inter. Symp. on Medical, Bio-and Nano-Electronics},
  year = 2009,
}

@inproceedings{CTT100615492,
  author = {S.Morishita and T.Goto and I.Akutsu and K.Ohyama and T.Ito and T.Ohmi},
  title = {High-Speed Gas Replacement in Plasma Process Chamber due to Precise Down-Flow of Gas Using a Upper Shower Plate},
  booktitle = {Dry Process International Symposium （DPS2008）},
  year = 2008,
}

@inproceedings{CTT100615479,
  author = {Fujii and S. Kuroki and X. Zhu and M. Numata and K. Kotani and T. Ito},
  title = {Crystallinity and Internal Strain of One-Dimensionally Long Si Grains by CW Laser Lateral Crystallization},
  booktitle = {214th ECS Meeting},
  year = 2008,
}

@inproceedings{CTT100615489,
  author = {Sadaharu Morishita and Tetsuya Goto and Takashi Ito and Tadahiro Ohmi},
  title = {Study on Gas Replacement Time in Plasma Process Chamber for Realizing Ideal Down Flow of Gas without Disturbance},
  booktitle = {Int. Symp. on Semicon. Manufacturing 2008 (ISSM2008)},
  year = 2008,
}

@inproceedings{CTT100615510,
  author = {S. Fujii and S. Kuroki and M. Numata and K. Kotani and T. Ito},
  title = {Roughness Reduction Technique for High Performance Poly-Si TFTs by CW Laser Lateral Crystallization with Cap SiO2 Thin Films},
  booktitle = {Extended Abstracts of the 2008 International Conference on Solid State Devices and Materials (SSDM2008)},
  year = 2008,
}

@inproceedings{CTT100615509,
  author = {S.Kuroki and K. Tago and K. Kotani and T. Ito},
  title = {Morphology Control of Ferroelectric  PZT Thin Films Crystallized On Glass with Continuous-Wave Green Laser},
  booktitle = {Extended Abstracts of the 2008 International Conference on Solid State Devices and Materials (SSDM2008)},
  year = 2008,
}

@inproceedings{CTT100615508,
  author = {Shuntaro Fujii and Shin-Ichiro Kuroki and Xiaoli Zhu and Masayuki Numata and Koji Kotani and Takashi Ito},
  title = {Carrier Transport Mechanism in Poly-Si TFTs with One-Dimensionally Long Grains},
  booktitle = {Extended Abstracts of the 2008 International Conference in Solid State Devices and Materials (SSDM2008)},
  year = 2008,
}

@inproceedings{CTT100615482,
  author = {S.Kuroki and K. Tago and K. Kotani and T. Ito},
  title = {Morphology Control of Ferroelectric  PZT Thin Films Crystallized On Glass with Continuous-Wave Green Laser},
  booktitle = {Extended Abstracts of the 2008 International Conference on Solid State Devices and Materials (SSDM2008)},
  year = 2008,
}

@inproceedings{CTT100615511,
  author = {Shuntaro Fujii and Shin-Ichiro Kuroki and Xiaoli Zhu and Masayuki Numata and Koji Kotani and Takashi Ito},
  title = {Carrier Transport Mechanism in Poly-Si TFTs with One-Dimensionally Long Grains},
  booktitle = {Extended Abstracts of the 2008 International Conference in Solid State Devices and Materials (SSDM2008)},
  year = 2008,
}

@inproceedings{CTT100615478,
  author = {Takashi Ito and Rinji Sugino},
  title = {Micro- and Nano-Cavity Formation on Silicon by   Using A Very Thin Native-Oxide Membrane},
  booktitle = {The 7th International Symposium on Electrochemical Micro & Nano system Technologies(EMNT2008)},
  year = 2008,
}

@inproceedings{CTT100615493,
  author = {Xiaoli Zhu and Shin-Ichiro Kuroki and Shuntaro Fujii and Masayuki Numata and Koji Kotani and Takashi Ito},
  title = {Research on Poly-Si TFTs with One-Dimensionally Long Grains Formed by CW Laser Lateral Crystallization},
  booktitle = {Proc. on SOIM-GCOE08},
  year = 2008,
}

@inproceedings{CTT100615476,
  author = {Takashi Ito and Koji Kotani and Toshihiko Miyashita},
  title = {Triode-like Non-Saturation Characteristics of SOI-MOSFETs under Reverse Drain Bias},
  booktitle = {Fourth Workshop of the Thermatic Network on Silicon-On-Insulator, Technology, Devices and Circuits (EUROSOI 2008)},
  year = 2008,
}

@inproceedings{CTT100615474,
  author = {Koji Kotani and Takashi Ito},
  title = {High Efficiency CMOS Rectifier Circuit with  Self-Vth-Cancellation and Power Regulation Functions for UHF RFIDs},
  booktitle = {IEEE Asian Solid-State Circuits Conference 2007 (A-SSCC 2007)},
  year = 2007,
}

@inproceedings{CTT100615473,
  author = {X. Zhu and S. Kuroki and K. Kotani and T. Ito},
  title = {Advantages of Nano-grating Substrates in CMOS -FET Characteristics},
  booktitle = {212th Electrochem. Soc. Meeting},
  year = 2007,
}

@inproceedings{CTT100615440,
  author = {Shin-Ichiro Kuroki and Masayuki Toda and Masaru Umeda and Koji Kotani and Takashi Ito},
  title = {Permittivity Enhancement of Mechanically Strained SrTiO3 MIM Capacitor},
  booktitle = {212th Electrochem. Soc. Meeting},
  year = 2007,
}

@inproceedings{CTT100615439,
  author = {S. Fujii and S. Kuroki and Z. Xiaoli and M. Numata and K. Kotani and T. Ito},
  title = {ateral  Recrystallized Si Thin Films with Large Tensile Strain for High Performance Thin  Film Transistors},
  booktitle = {Extended Abstracts of the 2007 International Conference on Solid State Devices and Materials (SSDM2007)},
  year = 2007,
}

@inproceedings{CTT100615438,
  author = {X. Zhu and S. Kuroki and K. Kotani and M. Fukuda and H. Shido and Y. Mishima and T. Ito},
  title = {The  Drivability Enhancement Mechanisms in Nano-grating MOSFETs},
  booktitle = {Extended Abstracts of the 2007 International Conference on Solid State Devices and Materials (SSDM2007)},
  year = 2007,
}

@inproceedings{CTT100615422,
  author = {Shuntaro Fujii and Shin-ichiro Kuroki and Koji Kotani and Takashi Ito},
  title = {Two-dimensional recrystallization of thin Si films using CW laser irradiation},
  booktitle = {Int. Symp. on Bio-and Nano-Electronics},
  year = 2006,
}

@inproceedings{CTT100615434,
  author = {Rinji Sugino and Takashi Ito},
  title = {A Formation of Si Native Oxide Membrane Using High-Selectivity Etching and Application for Nano-Pipe Array and Micro-Diaphragm on Si Substrate},
  booktitle = {Technical Digest of International Electron Devices Meeting (IEDM2006)},
  year = 2006,
}

@inproceedings{CTT100615431,
  author = {Sakai Yasufumi and Koji Kotani and Takashi Ito},
  title = {Analysis of Power Conversion Efficiency in Dickson Charge Pump for RFID},
  booktitle = {International Symposium on Bio- and Nano-Electronics},
  year = 2006,
}

@inproceedings{CTT100615436,
  author = {Makoto Miyamoto and Shin-Ichiro Kuroki and Koji Kotani and Satoshi Ueyama and Junji Hirotsuji and Takashi Ito},
  title = {High-Density Micro bubble Formation by Utilizing the Specific Additives for Chemical-less degreasing Process},
  booktitle = {Abstracts of MRS Meeting},
  year = 2006,
}

@inproceedings{CTT100615433,
  author = {Hisakazu Miyatake and Takashi Ito},
  title = {ArF Photo Resist Pattern Improvement by VUV Cure”, 2006 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices},
  booktitle = {2006 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD2006)},
  year = 2006,
}

@inproceedings{CTT100615432,
  author = {S.Kuroki and S.Fujii and K.Kotani and Takashi Ito},
  title = {Large Grain Growth of Silicon Thin  Films by using CW Green Laser},
  booktitle = {2006 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD2006)},
  year = 2006,
}

@inproceedings{CTT100615429,
  author = {K.Kotani and K.Tago and S.Kuroki and Takashi Ito},
  title = {Crystallization Enhancement of Ferroelectric PZT Thin Films by using Continuous-Wave Laser},
  booktitle = {2006 Asia-Pacific Workshop on Fundamentals and Application of Advanced Semiconductor Devices (AWAD2006)},
  year = 2006,
}

@inproceedings{CTT100615426,
  author = {Shin-ichiro Kuroki and Shuntaro Fujii and Koji Kotani and Takashi Ito},
  title = {Self-seeding Crystallization of Silicon Thin Films Using Continuous-Wave Laser},
  booktitle = {209th Electrochem. Soc. Meeting},
  year = 2006,
}

@inproceedings{CTT100615427,
  author = {Takashi Ito and Shin-ichiro Kuroki and Koji Kotani},
  title = {Drivability Enhancement of MOS Transistors Fabricated on Nano-grating Silicon Wafers},
  booktitle = {09th Electrochem. Soc. Meeting},
  year = 2006,
}

@inproceedings{CTT100634738,
  author = {Takashi Ito},
  title = {Two-dimensional recrystallization of thin Si films using CW laser irradiation},
  booktitle = {Int. Symp. on Bio-and Nano-Electronics},
  year = 2006,
}

@inproceedings{CTT100634737,
  author = {Takashi Ito},
  title = {Ultra-clean Processing of Silicon Surfaces with UV-radicals},
  booktitle = {Proc. Int. Symp. on Surface Science for Micro- and Nano-Device Fabrication},
  year = 1999,
}

@inproceedings{CTT100634672,
  author = {Kunihiro Suzuki and Tetsu Fukano and Tatsuya Yamazaki and Shinpei Hijiya and Takashi Ito and Hajime Ishikawa},
  title = {Pseudo-HBT with Polysilicon Emitter Contact and an Ultra shallow Highly Doped Base by Photoepitaxy},
  booktitle = {Tech. Dig. of, IEDM},
  year = 1998,
}

@inproceedings{CTT100634736,
  author = {Takashi Ito and Rinji Sugino},
  title = {Dry Cleaning Technologies Using UV-Excited Radicals and Cryogenic Aerosols},
  booktitle = {Proc. Fourth Int. Symp. on Ultra Clean Processing of Silicon Surfaces},
  year = 1998,
}

@inproceedings{CTT100634668,
  author = {Takashi Ito and Tatsuya Yamazaki and Satoru Watanabe and Yasuo Nara and Hajime Ishikawa},
  title = {Photoenhancement in Low-Temperature Silicon Epitaxy},
  booktitle = {Proc. Int. Symp. on Advanced Materials for ULSI, 1988 ECS Spring Meeting},
  year = 1998,
}

@inproceedings{CTT100634735,
  author = {Takashi Ito},
  title = {TECHNOLOGY ISSUES FOR FUTURE ULSI PRODUCTION},
  booktitle = {Symposium for Environmental Technologies and Strategies in Semiconductor Industry Sponsored by National Science Council(NSC)},
  year = 1997,
}

@inproceedings{CTT100634734,
  author = {Takashi Ito},
  title = {Process Expectation and Implications of Highly Purified Gases for the Next Generation ULSI Production},
  booktitle = {Proceeding of 6th International Pure Gas Workshop},
  year = 1996,
}

@inproceedings{CTT100634733,
  author = {Yoshihiro Sugita and Naoki Awaji and Satoshi Ohkubo and Satoru Watanabe and Satoshi Komiya and Takashi Ito},
  title = {X Ray Refractometry and Infrared Analysis of Native Oxides on Si(100) Formed in Chemical Treatment},
  booktitle = {Ext. Abst. of 1995 Int. Conf. on SSDM},
  year = 1995,
}

@inproceedings{CTT100634731,
  author = {Rinshi Sugino and Yoshiko Okui and Mayumi Shigeno and Satoshi  Ohkubo and Kanetake Takasaki and Takashi Ito},
  title = {Dry Cleaning of Si and SiO2 Surfaces Using SiC14 System},
  booktitle = {Proc. Int. Symp. on Semicon. Manufacturing},
  year = 1995,
}

@inproceedings{CTT100634729,
  author = {Hiromasa Hoko and Akira Ohishi and Yoshihiro Arimoto and Takashi Ito},
  title = {Global Planarization for 4 mm Square Pattern},
  booktitle = {Dumic Conference},
  year = 1995,
}

@inproceedings{CTT100634732,
  author = {Rinshi Sugino and Toshiro Nakanishi and Kanetake Takasaki and Takashi Ito},
  title = {Identification of MOS Gate Dielectric-Breakdown Spot Using High-Selectivity Etching},
  booktitle = {Ext. Abs. of Int. Conf. on SSDM},
  year = 1995,
}

@inproceedings{CTT100634726,
  author = {Takashi Ito},
  title = {Ultraclean Wafer Surfaces for High Performance ULSI Processing},
  booktitle = {Proc, Int, Symp. on Semicon. Manufacturing},
  year = 1994,
}

@inproceedings{CTT100634728,
  author = {Takashi Ito},
  title = {Formation of Clean Silicon Surfaces by Halogen Photo-Excitation and Hydrogen Termination},
  booktitle = {Proc. International Conf. on Advanced Microelectron. and Processing},
  year = 1994,
}

@inproceedings{CTT100634723,
  author = {Satoru Watanabe and Kei Horiuchi and Takashi Ito},
  title = {Stable Hydride Structure on Si(lll) Surface in Pure Water},
  booktitle = {Proc. MRS Symp.},
  year = 1993,
}

@inproceedings{CTT100634712,
  author = {Fumio Sugimoto and Hiroshi Horie and Yoshihiro Arimoto and Takashi Ito},
  title = {A pH-  Controlled Chemical Mechanical Polishing Method for Ultra-Thin Bonded SOI  Wafer},
  booktitle = {Dig. of Tech. Papers, Symp. on VLSI Tech.},
  year = 1993,
}

@inproceedings{CTT100634713,
  author = {Yasuo Nara and Yoshihiro Sugita and Kei Horiuchi and Takashi Ito},
  title = {SR-Assisted Epitaxy and Surface Cleaning of Silicon},
  booktitle = {Proc. of A Workshop on Two-dimensional Semiconductor Research using Synchrotron Radiation},
  year = 1993,
}

@inproceedings{CTT100634715,
  author = {Kunihiro Suzuki and Tetsu Tanaka and Hiroshi Horie and Yoshihiro Arimoto and Takashi Ito},
  title = {Analytical Surface Potential Expression for Double-Gate SOI MOS FETS},
  booktitle = {Proc. Int. Workshop on VLSI Process and Device Modeling},
  year = 1993,
}

@inproceedings{CTT100634716,
  author = {Takayuki Aoyama and Tatsuya Yamazaki and Takashi Ito},
  title = {Surface Cleaning for Silicon Epitaxy Using Photoexcited Fluorine Gas},
  booktitle = {Proc. of MRS Symposium},
  year = 1993,
}

@inproceedings{CTT100634718,
  author = {Takashi Ito and Rinshi Sugino and Yasuhisa Sato},
  title = {Reliable Thin Gate Oxide Film Formed After UV Cleaning},
  booktitle = {Proc. 4th Int. Symp. on ULSI Sci. and Tech.},
  year = 1993,
}

@inproceedings{CTT100634720,
  author = {Takashi Ito},
  title = {Photo-Excited Cleaning and Film Growth for ULSI},
  booktitle = {Proc. of Workshop on Photo-Excited Processes in Engineering},
  year = 1993,
}

@inproceedings{CTT100634722,
  author = {Akira Sato and Youichi Momiyama and Yasuo Nara and Toshihiro Sugii and Yoshihiro Arimoto and Takashi Ito},
  title = {A 0.5μm EEPROM Cell Using Poly-Si TFT Technology},
  booktitle = {Proc. 5lth Annual Device Research Conference},
  year = 1993,
}

@inproceedings{CTT100634725,
  author = {Tatsuya Yamazaki and Kenichi Goto and Tetsu Fukano and Yasuo Nara and Toshihiro Sugii and Takashi Ito},
  title = {2l psec Switching 0.13μm-CMOS at Room Temperature Using High Performance Co Salicide Process},
  booktitle = {IEDM Dig. of Tech.},
  year = 1993,
}

@inproceedings{CTT100634710,
  author = {Takashi Ito and Rinshi Sugino and Yasuhiro Sato and Masaki Okuno and Akira Osawa and Takayuki Aoyama and Tatsuya Yamazaki and Yoshihiro Arimoto},
  title = {Photo-Excited Cleaning of Silicon with Chlorine and Fluorine},
  booktitle = {MRS Symp. Proceeding},
  year = 1992,
}

@inproceedings{CTT100634709,
  author = {Yoshihiro Arimoto and Shinpei Hijiya and Takashi Ito},
  title = {Advanced Bipolar and MOS  Devices Based on Silicon Wafer-Bonding},
  booktitle = {Proc. 1st. Int. Symp. on Semicon. Wafer Bonding, ECS},
  year = 1992,
}

@inproceedings{CTT100634711,
  author = {Yasuo Nara and Yoshio Sugita and Kei Horiuchi and Takashi Ito},
  title = {Evaluation of  Photoemitted Current from SiO2 Film on Silicon during Synchrotron Radiation  lrradiation},
  booktitle = {Proc. of Microprocess Conference},
  year = 1992,
}

@inproceedings{CTT100634706,
  author = {Naoshi Higaki and Tetsu Fukano and Atsushi Fukuroda and Toshihiro Sugii and Yoshihiro   Arimoto and Takashi Ito},
  title = {A Thin-Base Lateral Bipolar Transistor Fabricated on   Bonded SOI},
  booktitle = {Dig. Tech. Papers of Symp. on VLSI Tech.},
  year = 1991,
}

@inproceedings{CTT100634689,
  author = {Yasuhisa Sato and Rinshi Sugino and Masaki Okuno and Nobuo Kikuchi and Junichi Teramae and Akinao Ogawa and Shinpei Hijiya and Takashi Ito},
  title = {Photo-Excited Dry Cleaning for ULSI},
  booktitle = {Proc. of VLSI Symp. on Tech. System and Application},
  year = 1991,
}

@inproceedings{CTT100634704,
  author = {Rinshi Sugino and Masaki Okuno and Yoshiko Okui and Mayumi Shigeno and Yasuhisa Sato and Akira Osawa and Takashi Ito},
  title = {UV Excited Dry Cleaning of Silicon Surfaces Contaminated with lron and Aluminum},
  booktitle = {Proc. of 2nd Int. Symp. on Cleaning Technology in Semicon. Device Manufacturing, ECS Fall Meeting},
  year = 1991,
}

@inproceedings{CTT100634701,
  author = {Takashi Ito},
  title = {Etching of SiO2 Film by Synchrotron Radiation in Hydrogen and its Application to Low Temperature Surface Cleaning},
  booktitle = {Proceeding of New Aspects of Photon Induced Processes on Surfaces, First International Forum of Optoelectronics Industry},
  year = 1991,
}

@inproceedings{CTT100634702,
  author = {Satoru Watanabe and Noriaki Nakayama and Takashi Ito},
  title = {Infrared Observation of Hydrogen-Terminated Silicon Surface with VUV Irradiation},
  booktitle = {Proceeding of New Aspects of Photon Induced Processes on Surfaces, First International Forum of Optoelectronics Industry},
  year = 1991,
}

@inproceedings{CTT100634705,
  author = {Takashi Ito},
  title = {Wafer Dry Cleaning with Photo-Excited Halogen Radicals},
  booktitle = {Proc. Inst. of Environmental Sciences, 37th Annual Meeting},
  year = 1991,
}

@inproceedings{CTT100634690,
  author = {Atsushi Fukuroda and Toru Miyabo and Manabu Kojima and Tetsu Fukano and Naoshi Higaki and Tatsuya Yamazaki and Toshihiro Sugii and Yoshihiro Arimoto and Takashi Ito},
  title = {Wafer Bonding and Thinning for High-Speed SOI Epitaxial-Base Transistor},
  booktitle = {Ext. Abst. of Int. Conf. on SSDM},
  year = 1991,
}

@inproceedings{CTT100634691,
  author = {Satoru Watanabe and Mayumi Shigeno and Noriaki Nakayama and Takashi Ito},
  title = {Silicon Monohydride Termination of Silicon (111) Surface Formed by Boiling Water},
  booktitle = {Ext. Abst. of 1991 Int. Conf. on SSDM},
  year = 1991,
}

@inproceedings{CTT100634694,
  author = {Manabu Kojim and Atsushi Fukuroda and Tetsu Fukano and Naoshi Higaki and Tatsuya Yamazaki and Toshihiro Sugii and Yoshihiro Arimoto and Takashi Ito},
  title = {High-Speed Epitaxial Base Transistors on Bonded SOI},
  booktitle = {IEEE 1991 ,Bipolar Circuits and Technology Meeting},
  year = 1991,
}

@inproceedings{CTT100634696,
  author = {Tatsuya Yamazaki and Itaru Namura and Toshihiro Sugii and Hiroshi Goto and Akinori Tahara and Takashi Ito},
  title = {High Speed Si Hetero-Bipolar Transistor with a SiC Wide-gap Emitter and an Ultra-thin Heavily Doped Photoepitaxially Grown Base},
  booktitle = {Proc. IEEE 1991 Bipolar Circuits and Technology Meeting},
  year = 1991,
}

@inproceedings{CTT100634697,
  author = {Takashi Ito},
  title = {Wafer Dry Cleaning with Photo-Excited Halogen Radicals},
  booktitle = {Proc. on SEMI/Korea Technology Symp.},
  year = 1991,
}

@inproceedings{CTT100634699,
  author = {Takashi Ito and Toshihiro Sugii and Tatsuya Yamazaki},
  title = {SiC(F) Hetero-Emitter and Epitaxial Base Bipolar Transistors},
  booktitle = {4th Int. Conf. on Amorphous and Crystalline Silicon Carbide and Other IV- IV Materials},
  year = 1991,
}

@inproceedings{CTT100634700,
  author = {Takashi Ito},
  title = {Silicon Hetero-Bipolar Transistor Technologies},
  booktitle = {Proc. 7th Japan-Germany Technology Forum},
  year = 1991,
}

@inproceedings{CTT100634686,
  author = {Tatsuya Yamazaki and Ikuo Namura and Hiroshi Goto and Atsushi Tahara and Takashi Ito},
  title = {A 11.7 GHz l/8 Divider using 43 GHz Si High Speed Bipolar Transistor with Photo-epitaxially Grown Ultra Thin Base},
  booktitle = {Tech. Digest of IEDM},
  year = 1990,
}

@inproceedings{CTT100634685,
  author = {Takashi Ito and Rinshi Sugino and Satoru Watanabe and Yasuo Nara and Yasuhisa Sato},
  title = {UV-Enhanced Dry Cleaning of Silicon Wafers},
  booktitle = {Proc. Int. Symp. on Cleaning Technology in Semicon. Device},
  year = 1990,
}

@inproceedings{CTT100634684,
  author = {Yasuhisa Sato and Rinshi Sugino and Masaki Okuno and Takashi Ito},
  title = {Reliability Improvement of the MOS Structures Using Photo-Excited Dry Cleaning Before Oxidation},
  booktitle = {Ext. Abst. of Int. Conf. on SSDM},
  year = 1990,
}

@inproceedings{CTT100634682,
  author = {Toshihiro Sugii and Takayuki Aoyama and Yuji Furumura and Takashi Ito},
  title = {SiC Growth   and Its Application to Si-HBTs},
  booktitle = {Proc. of American Vacuum Society Topical Symp. on Si Based Heterostructures},
  year = 1990,
}

@inproceedings{CTT100634683,
  author = {Kazuhisa Sugiyama and Takayuki lgarashi and Kazunori Moriki and Yoshikatsu Nagasawa and Takayuki Aoyama and Rinshi Sugino and Takashi Ito and Takeo Hattori},
  title = {Silicon-   Hydrogen Bonds in Native Oxides Formed During Wet Chemical Treatments},
  booktitle = {Ext.   Abst. of Int. Conf. on SSDM},
  year = 1990,
}

@inproceedings{CTT100634688,
  author = {Satoru Watanabe and Takashi Ito},
  title = {Diborane Addition Effect on Second Order Reactions of Si Photo-CVD under Vacuum Ultraviolet lrradiation},
  booktitle = {Ext. Abst. of Int. Conf. on SSDM},
  year = 1990,
}

@inproceedings{CTT100634687,
  author = {Toshihiro Sugii and Tatsuya Yamazaki and Takashi Ito},
  title = {Process Technologies for    Advanced Si Bipolar Devices},
  booktitle = {Ext. Abst, of Int. Conf. on SSDM},
  year = 1990,
}

@inproceedings{CTT100634678,
  author = {Kazuo Takase and Toshio Igarashi and Norio Miyata and Koji Moriki and Rinshi Sugino and Yasuo  Nara and Takashi Ito and Minoru Fujisawa and Takeo Hattori},
  title = {Native Oxide Formed  During Wet Chemical Treatments},
  booktitle = {Ext. Abs. of 2lst Conf. on SSDM},
  year = 1989,
}

@inproceedings{CTT100634674,
  author = {Kunihiro Suzuki and Tetsu Fukano and Hiroshi Ishiwari and Tatsuya Yamazaki and Masao Taguchi and Takashi Ito and Hajime Ishikawa},
  title = {50nm Ultra Thin Base Silicon Bipolar. Device Fabrication Based on Photo-epitaxial Growth},
  booktitle = {Digest of Symp. on VLSI Technology},
  year = 1989,
}

@inproceedings{CTT100634670,
  author = {Toshihiro Sugii and Tatsuya Yamazaki and Kunihiro Suzuki and Tetsu Fukano and Takashi Ito},
  title = {Si Hetero-Bipolar Transistor with an SiC Emitter and a Thin Epitaxial Base},
  booktitle = {Tech. Dig. of IEDM},
  year = 1989,
}

@inproceedings{CTT100634671,
  author = {Satoru Watanabe and Tatsuya Yamazaki and Takashi Ito},
  title = {Wavelength Dependence Boron Doping in Silicon Photochemical Vapor Deposition},
  booktitle = {Proc. of SPIE},
  year = 1989,
}

@inproceedings{CTT100634669,
  author = {Satoru Watanabe and Rinshi Sugino and Tatsuya Yamazaki and Yasuo Nara and Takashi Ito},
  title = {Wafer-Cleaning with Photo-Excited Chlorine and Thermal Treatment for High-Quality Silicon Epitaxy},
  booktitle = {Dig. of 2nd MicroProcess Conf.},
  year = 1989,
}

@inproceedings{CTT100634680,
  author = {Tatsuya Yamazaki and Hiroshi Minakata and Takashi Ito},
  title = {Abrupt and Defect-free p+-n+ Junction Formed by Low-Temperature Photo-Epitaxy with Continuous Boron and Phosphorous Doping},
  booktitle = {Ext. Abs. of 2lst Conf. on SSDM},
  year = 1989,
}

@inproceedings{CTT100634676,
  author = {Rinshi Sugino and Ryuji Takizawa and Yasuhisa Sato and Takashi Ito},
  title = {Characterization  of Si-SiO2 Interfaces Formed After Photo-Excited Cleaning},
  booktitle = {Ext. Abs. of 2lst Conf. on SSDM},
  year = 1989,
}

@inproceedings{CTT100634681,
  author = {Takeo Hattori and Kazuki Takase and Hiroshi Yamagishi and Rinshi Sugino and Yasuo Nara and Takashi Ito},
  title = {Chemical Structures of Native Oxides Formed During Wet Chemical    Treatments},
  booktitle = {Abstract of Electronic Mat. Conf.},
  year = 1989,
}

@inproceedings{CTT100634667,
  author = {Satoru Watanabe and Tatsuya Yamazaki and Yasuo Nara and Takashi Ito},
  title = {Photo- Enhanced Boron Doping in Low-Temperature Silicon Epitaxy and its FTIR Study},
  booktitle = {Ext. Abs. of 20th Conf. on SSDM},
  year = 1988,
}

@inproceedings{CTT100634658,
  author = {Takashi Kato and Takashi Ito and Hajime Ishikawa},
  title = {In Situ,Carbon-Doped Aluminum Metallization for VLSI/ULSI Interconnection},
  booktitle = {Tech. Dig. of IEDM},
  year = 1988,
}

@inproceedings{CTT100634657,
  author = {Takayuki Aoyama and Toshihiro Sugii and Takashi Ito},
  title = {Determination of Band Lineup In β-SiC/Si Hetero Junction for HBTs},
  booktitle = {Abs. 2nd Int. Conf. on Formation of Semiconductor Interfaces},
  year = 1988,
}

@inproceedings{CTT100634661,
  author = {Tetsuo Eshita and Kunihiro Suzuki and Toru Hara and Fumio Mieno and Yuji Furumura and Mamoru  Maeda and Toshihiro Sugii and Takashi Ito},
  title = {Low-Temperature Heteroepitaxy of β- SiC on Si(111) Substrates},
  booktitle = {Proc. MRS Symp.},
  year = 1988,
}

@inproceedings{CTT100634656,
  author = {Takashi Ito and Rinshi Sugino and Tatsuya Yamazaki and Satoru Watanabe and Yasuo Nara},
  title = {Photochemical Cleaning of Silicon Wafers with Halogen Radicals},
  booktitle = {1987 ECS Fall Meeting},
  year = 1987,
}

@inproceedings{CTT100634634,
  author = {Tatsuya Yamazaki and Satoru Watanabe and Toshihiro Sugii and Takashi Ito},
  title = {Ultra Shallow p+ /n Junction Formed by Photo-Enhanced Low-Temperature Epitaxy},
  booktitle = {Tech. Dig. of IEDM},
  year = 1987,
}

@inproceedings{CTT100634635,
  author = {Rinshi Sugino and Yasuo Nara and Tatsuya Yamazaki and Satoru Watanabe and Takashi Ito},
  title = {Through-Oxide Cleaning of Silicon Surface by Photo-Excited Radicals},
  booktitle = {Ext. Abs. of 19th Conf. on SSDM},
  year = 1987,
}

@inproceedings{CTT100634638,
  author = {Toshihiro Sugii and Tatsuya Yamazaki and Tetsu Fukano and Takashi Ito},
  title = {Thin-Base Bipolar Technology by Low-Temperature Photo-Epitaxy},
  booktitle = {Dig. of Symp. on VLSI Tech.},
  year = 1987,
}

@inproceedings{CTT100634655,
  author = {Kunihiko Wada and Takashi Ito},
  title = {Growth and Properties of Silicon Dioxide Films},
  booktitle = {Proc. Symp. on ULSI Science and Tech., ECS Spring  Meeting},
  year = 1987,
}

@inproceedings{CTT100634632,
  author = {Takashi Ito and Hajime Ishikawa},
  title = {Current Status of Surface Nitridation on Silicon and Silicon-Dioxide},
  booktitle = {Proc. 5th Int. Symp. on Silicon Mat. Sci, and Tech., ECS Fall Meeting},
  year = 1986,
}

@inproceedings{CTT100634626,
  author = {Toshihiro Sugii and Takashi Ito and Yuji Furumura and Mikio Doki and Fumio Mieno and Mamoru Maeda},
  title = {Epitaxial SiC Emitter for High Speed Bipolar VLSI's},
  booktitle = {Dig. Symp. on VLSI Tech.},
  year = 1986,
}

@inproceedings{CTT100634630,
  author = {Takashi Ito and Hajime Ishikawa},
  title = {Thermal Nitridation Technologies for VLSI},
  booktitle = {Proc. Int. Conf. on Semicon. and Integrated Circ. Tech.},
  year = 1986,
}

@inproceedings{CTT100634625,
  author = {Tatsuya Yamazaki and Rinshi Sugino and Takashi Ito and Hajime Ishikawa},
  title = {Photo-Chemical Effects for Low Temperature Si Epitaxy},
  booktitle = {Ext. Abst. of 1986 Int. Conf. on SSDM},
  year = 1986,
}

@inproceedings{CTT100634614,
  author = {Masaru Muto and Takashi Kato and Takashi Ito and Hajime Ishikawa},
  title = {ZrSi2 for LSI Contat System},
  booktitle = {Proc. of Tech. papers on Int. Symp. on VLSI Tech. Sys. and Appli.},
  year = 1985,
}

@inproceedings{CTT100634618,
  author = {Takashi Ito and Ichiro Kato and Hajime Ishikawa},
  title = {Plasma Enhancement in Direct Nitridation of Silicon and Silicon-Dioxide},
  booktitle = {MRS Symp. Proc. 38},
  year = 1985,
}

@inproceedings{CTT100634617,
  author = {Takashi Ito and Hiroshi Horie and Tetsu Fukano and Hajime Ishikawa},
  title = {A Nitride Isolated Molybdenum-Polysilicon Gate Electrode},
  booktitle = {Dig. of Tech. Papers on 1985 Symp. on VLSI Tech.},
  year = 1985,
}

@inproceedings{CTT100634615,
  author = {Masaru Muto and Takashi Kato and Takashi Ito and Hajime Ishikawa},
  title = {Self-aligned  Silicidation of Zr and Its Comparison with Ti},
  booktitle = {Ext. Abst. of 17th Conf. on SSDM},
  year = 1985,
}

@inproceedings{CTT100634620,
  author = {Tetsu Fukano and Takashi Ito and Hajime Ishikawa},
  title = {Microwave Annealing for Low Temperature VLSI Processing},
  booktitle = {Tech. Dig. of IEDM},
  year = 1985,
}

@inproceedings{CTT100634613,
  author = {Tatsuya Yamazaki and Takashi Ito and Hajime Ishikawa},
  title = {Disilane Photoepitaxy for VLSI},
  booktitle = {Dig. of Tech. Papers on 1984 Symp. on VLSI Tech.},
  year = 1984,
}

@inproceedings{CTT100634612,
  author = {Tetsu Fukano and Takashi Ito and Tokushige Hisatsugu and Hajime Ishikawa},
  title = {Ultra Sharp Trench Capacitors Formed by Peripheral Etching},
  booktitle = {Ext. Abst. of 16th (1984 International Conf. on SSDM},
  year = 1984,
}

@inproceedings{CTT100634611,
  author = {Toshihiro Sugii and Takashi Ito and Hajime Ishikawa},
  title = {Low Temperature Nitridation of Silicon by Excimer Laser lrradiation},
  booktitle = {Ext. Abst. of 16th (1984 International Conf. on SSDM},
  year = 1984,
}

@inproceedings{CTT100634610,
  author = {Hiroshi Horie and Tetsu Fukano and Takashi Ito and Hajime Ishikawa},
  title = {Multiple Self-Alignment MOS Technology (MUSA/MOS)},
  booktitle = {Tech. Dig. of IEDM},
  year = 1984,
}

@inproceedings{CTT100634606,
  author = {Takashi Ito and Ichiro Kato and Tetsuo Nakamura and Hajime Ishikawa},
  title = {Thermal Nitride Thin Films for VLSI Circuits},
  booktitle = {Proc. of Symp. on Silicon Nitride Thin Insulating Films, ECS},
  year = 1983,
}

@inproceedings{CTT100634609,
  author = {Takashi Kato and Takashi Ito and Masao Taguchi and Tetsuo Nakamura and Hajime Ishikawa},
  title = {Interfacial Oxidation of Ta205-Si Systems for High Density DRAM},
  booktitle = {Dig. of Tech. Papers on 1983 Symp. on VLSI Tech.},
  year = 1983,
}

@inproceedings{CTT100634608,
  author = {Ichiro Kato and Takashi Ito and Tetsuo Nakamura and Hajime Ishikawa},
  title = {Plasma Nitrided Silicon Dioxide Film for VLSI Gate Dielectrics},
  booktitle = {Elec. Mat. Conf.},
  year = 1983,
}

@inproceedings{CTT100634607,
  author = {Kiyoshi Ozawa and Takashi Ito and Hajime Ishikawa},
  title = {UV Resist Stripping for High Speed and Damage Free Process},
  booktitle = {Ext. Abst. of 15th Conf. on SSDM},
  year = 1983,
}

@inproceedings{CTT100634604,
  author = {Shinpei Hijiya and Takashi Ito and Tetsuo Nakamura and Hajime Ishikawa and Hideki Arakawa},
  title = {A Nitride Barrier Avalanche Injection EAROM},
  booktitle = {ISSCC Dig. of Tech. Papers},
  year = 1982,
}

@inproceedings{CTT100634605,
  author = {Takashi Ito and Toshihiko Sugii and Tetsuo Nakamura},
  title = {Aluminum Plasma CVD for VLSI Circuit Inter-connections},
  booktitle = {Dig. of Tech. Papers on 1982 Symp. on VLSI Tech.},
  year = 1982,
}

@inproceedings{CTT100634602,
  author = {Masao Taguchi and Takashi Ito and Tetsu Fukano and Tetsuo Nakamura and Hajime Ishikawa},
  title = {Thermal Nitride Capacitors for High Density RAMs},
  booktitle = {Tech. Dig. of IEDM},
  year = 1981,
}

@inproceedings{CTT100634603,
  author = {Takashi Ito and Tetsuo Nakamura and Hajime Ishikawa},
  title = {Thin Gate Insulators for VLSI},
  booktitle = {Dig. of Tech. Papers on 1981 Symp. on VLSI Tech.},
  year = 1981,
}

@inproceedings{CTT100634601,
  author = {Ichiro Kato and Takashi Ito and Shinichi Inoue and Tetsuo Nakamura and Hajime Ishikawa},
  title = {Ammonia Annealed SiO2. Films for Thin Gate Insulators},
  booktitle = {Ext. Abs. on 13th Conf. on SSDM},
  year = 1981,
}

@inproceedings{CTT100634598,
  author = {Takashi Ito and Takao Nozaki and Hajime Ishikawa and Yukio Fukukawa},
  title = {Thermal Nitride Gate FET Technology for VLSI Devices},
  booktitle = {ISSCC Dig. of Tech. Papers},
  year = 1980,
}

@inproceedings{CTT100634600,
  author = {Shinpei Hijiya and Takashi Ito and Tetsuo Nakamura and Nobuo Toyokura and Hajime Ishikawa},
  title = {Electrically Alterable Read Only Memory Cell with Graded Energy Band-Gap Insulator},
  booktitle = {Tech. Dig. of IEDM},
  year = 1980,
}

@inproceedings{CTT100634599,
  author = {Takashi Ito and Hajime Ishikawa and Yukio Fukukawa},
  title = {Thermal Nitridation of Silicon in Advanced LSI Processing},
  booktitle = {Ext. Abs. on 12th Conf. on SSDM},
  year = 1980,
}

@inproceedings{CTT100634597,
  author = {Takashi Ito and Shinpei Hijiya and Hajime Ishikawa and Masaichi Shinoda},
  title = {0V Write/Erase EAROM Cells with Directly Nitrided Silicon Nitride Films as First  Insulating Layers},
  booktitle = {Tech. Dig. of IEDM},
  year = 1977,
}

@inproceedings{CTT100634596,
  author = {Takashi Ito and Shinpei Hijiya and Hidetoshi Nishi and Masaichi Shinoda and Toshio Furuya},
  title = {Interfacial Doping by Recoil Implantation for Nonvolatile Memories},
  booktitle = {Ext. Abs. on 9th Conf: on SSDM},
  year = 1977,
}

@inproceedings{CTT100634595,
  author = {Takashi Ito and Takao Nozaki and Hideki Arakawa and Shinpei Hijiya and Masaichi Shinoda and Yukio Fukukawa},
  title = {Thermally Nitrided Silicon Films By Direct Reaction},
  booktitle = {Abs. of 150th ECS Fall Meeting},
  year = 1976,
}