論文

• Kanetake Takasaki, Kiyoshi Irino, Takayuki Aoyama, Youichi Momiyama, Toshiro Nakanishi, Yasuyuki Tamura, Takashi Ito. Impact of Nitrogen Profile in Gate Nitrided-Oxide on Deep-Submicron CMOS Performance and Reliability, Fujitsu Sci. and Tech. Jour., Fujitsu, Vol. 39, No. 1, pp. 40-51, Jan. 2003.
• Kanetake Takasaki, Kiyoshi Irino, Takayuki Aoyama, Youichi Momiyama, Toshiro Nakanishi, Yasuyuki Tamura, Takashi Ito. Impact of Nitrogen Profile in Gate Nitrided-Oxide on Deep-Submicron CMOS Performance and Reliability, FUJITSU SCIENTIFIC & TECHNICAL JOURNAL, Fijitsu, Vol. 39, No. 1, pp. 40-51, 2003.

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