論文

• Linards Skuja, Koichi Kajihara, Jurgis Grube, Hideo Hosono. Luminescence of non-bridging oxygen hole centers in crystalline SiO2, AIP Conf. Proc., Vol. 1624, pp. 130-134, 2014.
• Koichi Kajihara, Linards Skuja, Hideo Hosono. Diffusion and Reactions of Photoinduced Interstitial Oxygen Atoms in Amorphous SiO₂ Impregnated with ¹⁸O-Labeled Interstitial Oxygen Molecules, J. Phys. Chem. C, Vol. 118, pp. 4282-4286, 2014.
• Koichi Kajihara, Linards Skuja, Hideo Hosono. Inhomogeneous broadening and peak shift of the 7.6 eV optical absorption band of oxygen vacancies in SiO2, AIP Conf. Proc., Vol. 1624, pp. 58-63, 2014.
• Koichi Kajihara, Linards Skuja, Hideo Hosono. Formation and annihilation of intrinsic defects induced by electronic excitation in high-purity crystalline SiO₂, J. Appl. Phys, Vol. 113, No. 143511, pp. 1 - 4, 2013.
• L. Skuja, K. Kajihara, M. Hirano, H. Hosono. Oxygen-excess-related point defects in glassy/amorphous SiO₂ and related materials, Nuclear Instruments and Methods in Physics Research B, Vol. 286, pp. 159-168, 2012.
• Koichi Kajihara, Linards Skuja, Hideo Hosono. ¹⁸O-labeled interstitial oxygen molecules as probes to study reactions involving oxygen-related species in amorphous SiO₂, Journal of Non-Crystalline Solids, Vol. 358, pp. 3524-3530, 2012.
• Koichi Kajihara, Taisuke Miura, Hayato Kamioka, Masahiro Hirano, Linards Skuja, Hideo Hosono. Exchange between interstitial oxygen molecules and network oxygen atoms in amorphous SiO₂ studied by ¹⁸O isotope labeling and infrared photoluminescence spectroscopy, PHYSICAL REVIEW B, Vol. 83, p. 064202, 2011.
• Koichi Kajihara, Masahiro Hirano, Linards Skuja, Hideo Hosono. Oxygen-excess amorphous SiO₂ with ¹⁸O-labeled interstitial oxygen molecules, J. Non-Cryst. Sol, Vol. 357, pp. 1842-1845, 2011.
• Linards Skuja, Koichi Kajihara, Masahiro Hirano, Hideo Hosono. Crucial dependence of excimer laser toughness of “wet”silica on excess oxygen, J. Non-Cryst. Sol, Vol. 357, pp. 1875-1878, 2011.
• Koichi Kajihara, Masahiro Hirano, Linards Skuja, Hideo Hosono. Frenkel defect process in amorphous silica, Proc. of SPIE, Vol. 8077, pp. 80770R-1-12, 2011.
• L. Skuja, K. Kajihara, M. Hirano, A. Silins, H. Hosono. Effects of temperature on electron paramagnetic resonance of dangling oxygen bonds in amorphous silicon dioxide, IOP Conf. Series: Materials Science and Engineering, Vol. 23, p. 012016, 2011.
• Linards Skuja, Koichi Kajihara, Masahiro Hirano, Hideo Hosono. Visible to vacuum-UV range optical absorption of oxygen dangling bonds in amorphous SiO₂, Phys. Rev. B, Vol. 84, p. 205206, 2011.
• Koichi Kajihara, Masahiro Hirano, Linards Skuja, Hideo Hosono. Frenkel defect process in amorphous silica, Proc. of SPIE, p. 8077, 80770R, 2011.
• Koichi Kajihara, Masahiro Hirano, Linards Skuja, Hideo Hosono. Role of Interstitial Voids in Oxides on Formation and Stabilization of Reactive Radicals:  Interstitial HO2 Radicals in F2-Laser-Irradiated Amorphous SiO2, Journal of the American Chemical Society, Vol. 128, No. 16, pp. 5371-5374, Mar. 2006.

著書

• Koichi Kajihara, Linards Skuja, Hideo Hosono. Chapter 5: Frenkel Defect Process in Silicon Dioxide, Radiation Synthesis of Materials and Compounds, 2013.

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