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研究業績一覧 (1件)
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論文
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Kiichi Tachi,
N. Vulliet,
S. Barraud,
Kuniyuki KAKUSHIMA,
HIROSHI IWAI,
S. Cristoloveanu,
T. Ernst.
Influence of source/drain formation process on resistance and effective mobility for scaled multi-channel MOSFET”,
Solid-State Electronics,
Vol. 65-66,
pp. 16-21,
Nov. 2011.
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